Thin film depositing method and apparatus

  • US 20040121086A1
  • Filed: 12/01/2003
  • Published: 06/24/2004
  • Est. Priority Date: 05/31/2002
  • Status: Abandoned Application
First Claim
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1. A thin film depositing method comprising the steps of:

  • placing a substrate in a chamber;

    causing a gas to flow into said chamber to heat said substrate through heat exchange with said gas;

    evacuating said chamber; and

    depositing a film on a surface of said substrate heated in said chamber.

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