Chemical vapor deposition apparatus

• US 20040200413A1
• Filed: 12/31/2003
• Published: 10/14/2004
• Est. Priority Date: 04/14/2003
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Electronics Limited (Samsung Electronics Co. Ltd.)
• Inventors: Lee, Ho
• Granted Patent: US 7,217,326 B2
• Time in Patent Office: Days
• US Class Current: 118/715
• CPC Class Codes: C23C 16/455 characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45591 Fixed means, e.g. wings, baffles
• CPC Class Codes: C23C 16/5096 Flat-bed apparatus

Abstract

A chemical vapor deposition apparatus is provided, which includes: a chamber having an inner space; a gas feed member for supplying a gas into the chamber; a susceptor disposed in the chamber and supporting a substrate; a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication; a diffuser frame incorporated into the diffuser; and an insulating frame disposed between the chamber and the diffuser.

Claims

1. A chemical vapor deposition apparatus comprising:

a chamber having an inner space;

a gas feed member for supplying a gas into the chamber;

a susceptor disposed in the chamber and supporting a substrate;

a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication; and

an insulating frame disposed between the chamber and the diffuser,

wherein the diffuser includes an extension overlapping a surface of the insulating frame.

2. The apparatus of claim 1, wherein the extension of the diffuser has an “

L”

shape.

3. The apparatus of claim 1, wherein the diffuser comprises Al or stainless steel.

4. The apparatus of claim 1, wherein the insulating frame comprises ceramic.

5. The apparatus of claim 1, wherein the substrate comprises glass.

6. The apparatus of claim 1, wherein the substrate is prepared for a liquid crystal display.

7. The apparatus of claim 1, further comprising a blocking member for mixing and spreading the gas from the gas feed member before the gas passes through the holes of the diffuser.

8. The apparatus of claim 1, wherein the diffuser is electrically powered and the susceptor is electrically grounded.

9. A chemical vapor deposition apparatus comprising:

a chamber having an inner space;

a gas feed member for supplying a gas into the chamber;

a susceptor disposed in the chamber and supporting a substrate;

a diffuser partitioning the inner space of the chamber into first and second partitions and having a plurality of holes connecting the first partition and the second partition for gas communication;

a diffuser frame incorporated into the diffuser; and

an insulating frame disposed between the chamber and the diffuser.