Method for fabricating an interference display unit
First Claim
1. A method for manufacturing an optical interference display unit disposed on a substrate, the method comprising:
- forming a first electrode on the substrate;
forming a sacrificial layer on the first electrode;
forming at least two openings in the sacrificial layer and the first electrode to define a position of the optical interference display unit;
forming a photosensitive material layer to fill the openings and cover the sacrificial layer;
patterning the photosensitive material layer to form a support in each of the openings and at least one arm on the support, wherein the support and the at least one arm form a post;
forming a second electrode on the sacrificial layer and the at least one arm;
performing a thermal process to treat the post; and
removing the sacrificial layer.
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Accused Products
Abstract
A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the openings. A photolithographic process patterns the photoresist layer to define a support with an arm. A second plate is formed on the sacrificial layer and posts. The arm'"'"'s stress is released through a thermal process. The position of the arm is shifted and the distance between the first plate and the second plate is therefore defined. Finally, The sacrificial layer is removed.
223 Citations
35 Claims
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1. A method for manufacturing an optical interference display unit disposed on a substrate, the method comprising:
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forming a first electrode on the substrate;
forming a sacrificial layer on the first electrode;
forming at least two openings in the sacrificial layer and the first electrode to define a position of the optical interference display unit;
forming a photosensitive material layer to fill the openings and cover the sacrificial layer;
patterning the photosensitive material layer to form a support in each of the openings and at least one arm on the support, wherein the support and the at least one arm form a post;
forming a second electrode on the sacrificial layer and the at least one arm;
performing a thermal process to treat the post; and
removing the sacrificial layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A method for manufacturing an optical interference display unit disposed on a substrate, the method comprising:
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forming a first electrode on the substrate;
forming a sacrificial layer on the first electrode;
forming at least two openings in the sacrificial layer and the first electrode to define a position of the optical interference display unit;
forming a support in each of the openings and at least one arm on the support, wherein the support and the at least one arm form a post;
forming a second electrode on the sacrificial layer and the at least one arm;
performing a thermal process to treat the post; and
removing the sacrificial layer. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification