Method for fabricating optical interference display cell
First Claim
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1. A method for manufacturing an optical interference display cell on a substrate, the method comprising:
- forming a first electrode on the substrate;
forming a sacrificial layer on the first electrode;
forming at least two openings in the sacrificial layer and the first electrode to define a position of the optical interference display cell;
forming a heat-resistant insulating inorganic supporter in each of the openings;
forming a second electrode on the sacrificial layer and the heat-resistant insulating inorganic supporter in each opening; and
removing the sacrificial layer by a remote plasma etching process.
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Abstract
A method for fabricating an optical interference display cell is described. A first electrode and a sacrificial layer are sequentially formed on a transparent substrate and at least two openings are formed in the first electrode and the sacrificial layer to define a position of the optical interference display cell. An insulated heat-resistant inorganic supporter is formed in each of the openings. A second electrode is formed on the sacrificial layer and the supporters. Finally, a remote plasma etching process is used for removing the sacrificial layer.
346 Citations
29 Claims
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1. A method for manufacturing an optical interference display cell on a substrate, the method comprising:
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forming a first electrode on the substrate;
forming a sacrificial layer on the first electrode;
forming at least two openings in the sacrificial layer and the first electrode to define a position of the optical interference display cell;
forming a heat-resistant insulating inorganic supporter in each of the openings;
forming a second electrode on the sacrificial layer and the heat-resistant insulating inorganic supporter in each opening; and
removing the sacrificial layer by a remote plasma etching process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A method for manufacturing an optical interference display cell on a substrate, the method comprising:
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forming a first electrode on the substrate;
forming a sacrificial layer on the first electrode;
forming at least two openings in the sacrificial layer and the first electrode to define a position of the optical interference display cell;
forming a heat-resistant insulating inorganic supporter in each of the openings;
forming a second electrode on the sacrificial layer and the heat-resistant insulating inorganic supporter in each opening; and
removing the sacrificial layer by a remote plasma etching process performed at a temperature between about 250°
C. and about 500°
C. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29)
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Specification