Cylindrical magnetron with self cleaning target

• US 20050051422A1
• Filed: 08/12/2004
• Published: 03/10/2005
• Est. Priority Date: 02/21/2003
• Status: Abandoned Application

• Current Assignee: Applied Films Corp. (Applied Materials Incorporated)
• Original Assignee: Applied Films Corp. (Applied Materials Incorporated)
• Inventors: Johnson, Kevin, Banta, Rodney B., Rietzel, James G.
• Application Number:
  US10/917,733
• Publication Number:
  US 20050051422A1
• Time in Patent Office: Days
• US Class Current: 204/192.120
• CPC Class Codes: H01J 2237/022 Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
• CPC Class Codes: H01J 37/32568 Relative arrangement or disposition of electrodes; moving means
• CPC Class Codes: H01J 37/32577 Electrical connecting means
• CPC Class Codes: H01J 37/32596 Hollow cathodes
• CPC Class Codes: H01J 37/32862 In situ cleaning of vessels and/or internal parts
• CPC Class Codes: H01J 37/3405 Magnetron sputtering
• CPC Class Codes: H01J 37/3435 Target holders (includes backing plates and endblocks)

Abstract

A cylindrical magnetron capable of running at high current and voltage levels with a target tube that is self cleaning not only in the center portion, but also at the ends. Sputtering the ends of the target tube virtually eliminates accumulation of condensate at the ends and any resultant arcing, resulting in a more reliable magnetron requiring less service and a magnetron that produces more consistent coatings. A low sputtering-rate collar is affixed to the target tube in the turnaround area.

Claims

1. A cylindrical magnetron target, comprising:

a tube portion;

a collar portion that encircles the tube portion and that has a cylindrical inner surface that is in contact with the tube portion; and

a capturing portion that is attached to the tube portion so as to capture the collar portion in a fixed location with respect to the tube portion

2. The cylindrical magnetron target of claim 1 wherein the tube portion has a first cylindrical portion having a first outer diameter about an axis and a second cylindrical portion having a second outer diameter about the axis, the second outer diameter is less than the first outer diameter, the second portion located adjacent to an axial extremity of the tube portion such that the inner surface of the collar portion fits over the second portion but does not fit over the first portion.

3. The cylindrical magnetron target of claim 2 wherein the boundary between the first portion and the second portion forms a shoulder and the collar portion is captured between the shoulder and the capturing portion in the direction of the axis of the tube portion.

4. The cylindrical magnetron target of claim 2 wherein the inner surface of the collar portion is cylindrical and has a diameter that is approximately equal to the second outer diameter of the second cylindrical portion of the tube portion.

5. The cylindrical magnetron target of claim 2 wherein the collar portion has a truncated conical shape and the truncated cone is coaxial with the cylindrical inner surface of the collar portion.

6. The cylindrical magnetron target of claim 1 wherein the tube portion and the capturing portion are made of stainless steel and the collar portion is made of Titanium.

7. The cylindrical magnetron target of claim 6 wherein the capturing portion is welded to the tube portion but the collar portion is not welded.

8. The cylindrical magnetron target of claim 1 further comprising a clamping portion that encircles at least part of the collar portion.

9. A method of forming a cylindrical target for sputtering applications, comprising:

inserting a tube portion within a collar portion;

attaching a capturing portion to the tube portion such that the location of the collar portion is fixed with respect to the tube portion; and

subsequently forming a layer of target material on a cylindrical surface of the tube portion.

10. The method of claim 9 further comprising forming a shoulder on the tube portion so that an outer surface of the tube portion has a reduced diameter in an end region compared with a central region, the reduced diameter allowing insertion of the end region within the collar portion, the shoulder preventing insertion of the central region within the collar portion.

11. The method of claim 10 wherein the collar portion has axial symmetry about an axis of the tube portion and an end of the collar portion nearest to the shoulder forms a truncated cone, the layer of target material formed on the cylindrical surface of the tube portion also formed on the truncated cone of the collar portion.

12. A target collar for attachment of a target within a coating system, comprising:

an inner surface that defines a cylindrical opening in the target collar, the cylindrical opening having an axis; and

an outer conical surface defined by a truncated cone that shares the axis of the cylindrical opening.

13. The target collar of claim 12 further comprising a circumferential groove that extends around the target collar.

14. An endblock for holding a target tube in a cylindrical magnetron sputtering system and for transferring alternating electrical current from a source of current to the target tube, comprising:

a central conductive portion that carries the alternating electrical current from the source of current to the target tube; and

a partial ring of conductive material that extends to partially circumscribe the central portion but does not fully circumscribe the central portion;

15. The endblock of claim 14 wherein the partial ring portion is a retaining ring that maintains the location of a portion of the endblock.