Multi-exposure drawing method and apparatus thereof
First Claim
1. A drawing method for drawing a pattern on a drawing surface comprising:
- a first converting step in which first vector-graphic data of a drawing-coordinate-system, that represents all information on said pattern, is converted in an exposure drawing apparatus having a plurality of optical modulation elements, to second vector-graphic data of an exposing-coordinate-system that conforms to said exposure drawing apparatus;
a second converting step in which said second vector-graphic data is converted to raster-graphic data of the exposing-coordinate-system, to control the exposure by said optical modulation elements; and
a multi-exposing step in which said drawing surface is multi-exposed for drawing said pattern, based on said raster-graphic data.
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Accused Products
Abstract
In a drawing method, all information on a pattern to be drawn on a drawing surface, represented by first vector-graphic data of a drawing-coordinate-system, is transmitted to an exposure drawing apparatus having a plurality of optical modulation elements. The first vector-graphic data is converted to second vector-graphic data of an exposing-coordinate-system that conforms to the exposure drawing apparatus, and the second vector-graphic data is converted to raster-graphic data of the exposing-coordinate-system. Finally, the drawing surface is multi-exposed for drawing the pattern, based on the raster-graphic data to control the exposure by the optical modulation elements.
24 Citations
10 Claims
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1. A drawing method for drawing a pattern on a drawing surface comprising:
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a first converting step in which first vector-graphic data of a drawing-coordinate-system, that represents all information on said pattern, is converted in an exposure drawing apparatus having a plurality of optical modulation elements, to second vector-graphic data of an exposing-coordinate-system that conforms to said exposure drawing apparatus;
a second converting step in which said second vector-graphic data is converted to raster-graphic data of the exposing-coordinate-system, to control the exposure by said optical modulation elements; and
a multi-exposing step in which said drawing surface is multi-exposed for drawing said pattern, based on said raster-graphic data. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A multi-exposure drawing apparatus for drawing a pattern on a drawing surface comprising:
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an exposure unit that includes a plurality of optical modulation elements, a first converter that converts first vector-graphic data of a drawing-coordinate-system, that represents all information on said pattern, to second vector-graphic data of an exposing-coordinate-system, a second converter that converts said second vector-graphic data to raster-graphic data of the exposing-coordinate-system, and a multi-exposing system that operates said plurality of optical modulation elements to draw said pattern based on said raster-graphic data. - View Dependent Claims (8, 9, 10)
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Specification