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Method and system of diagnosing a processing system using adaptive multivariate analysis

  • US 20050060103A1
  • Filed: 09/12/2003
  • Published: 03/17/2005
  • Est. Priority Date: 09/12/2003
  • Status: Active Grant
First Claim
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1. A method of monitoring a processing system for processing a substrate during the course of semiconductor manufacturing, comprising:

  • acquiring data from said processing system for a plurality of observations, said data comprising a plurality of data parameters;

    constructing a principal components analysis (PCA) model from said data, including centering coefficients;

    acquiring additional data from said processing system, said additional data comprising an additional observation of said plurality of data parameters;

    adjusting said centering coefficients to produce updated adaptive centering coefficients for each of said data parameters in said PCA model;

    applying said updated adaptive centering coefficients to each of said data parameters in said PCA model;

    determining at least one statistical quantity from said additional data using said PCA model;

    setting a control limit for said at least one statistical quantity; and

    comparing said at least one statistical quantity to said control limit.

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