Multilayer coatings for EUV mask substrates

  • US 20050064298A1
  • Filed: 09/18/2003
  • Published: 03/24/2005
  • Est. Priority Date: 09/18/2003
  • Status: Active Grant
First Claim
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1. A method, the method comprising:

  • using ion beam deposition to deposit a first multilayer stack of thin films on a substrate to planarize and smooth surface defects on the substrate; and

    using atomic layer deposition to deposit a second multilayer stack of thin films on the first multilayer stack of thin films, the second multilayer stack of thin films comprising an extreme ultraviolet reflective multilayer stack.

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