Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
First Claim
1. A method for forming a pattern within an area of a photosensitive surface, comprising:
- performing a first exposure of the photosensitive surface in accordance with predetermined image data;
wherein the first exposure produces a first image within the area;
identifying image deficiencies within a region of the first image;
adjusting the image data to compensate for the identified image deficiencies; and
performing a second exposure of the photosensitive surface in accordance with the adjusted image data.
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Accused Products
Abstract
A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
37 Citations
22 Claims
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1. A method for forming a pattern within an area of a photosensitive surface, comprising:
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performing a first exposure of the photosensitive surface in accordance with predetermined image data;
wherein the first exposure produces a first image within the area;
identifying image deficiencies within a region of the first image;
adjusting the image data to compensate for the identified image deficiencies; and
performing a second exposure of the photosensitive surface in accordance with the adjusted image data. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An apparatus configured for forming a pattern within an area of a photosensitive surface, comprising:
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means for performing a first exposure of the photosensitive surface in accordance with predetermined image data;
wherein the first exposure produces a first image within the area;
means for identifying image deficiencies within a region of the first image;
means for adjusting the image data to compensate for the identified image deficiencies; and
means for performing a second exposure of the photosensitive surface in accordance with the adjusted image data. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A computer readable medium carrying one or more sequences of one or more instructions for execution by one or more processors to perform a method of a method of forming a pattern within an area of a photosensitive surface, the instructions when executed by the one or more processors, cause the one or more processors to perform the steps of:
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performing a first exposure of the photosensitive surface in accordance with predetermined image data;
wherein the first exposure produces a first image within the area;
identifying image deficiencies within a region of the first image;
adjusting the image data to compensate for the identified image deficiencies; and
performing a second exposure of the photosensitive surface in accordance with the adjusted image data.
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22. A method for forming a pattern within an area of a photosensitive surface, comprising:
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performing a first exposure of the photosensitive surface in accordance with predetermined image data;
wherein the first exposure produces a first image within the area;
adjusting the image data to compensate for image deficiencies; and
performing a second exposure of the photosensitive surface in accordance with the adjusted image data, the image deficiencies being within a region of the first image.
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Specification