Process for manufacturing microelectronic, microoptoelectronic or micromechanical devices
First Claim
Patent Images
1. A process for manufacturing a device for use in the production of a microdevice including the steps of:
- creating a support device by deposing discrete deposits of contaminant removing material on a base layer of a material selected from the group consisting of glasses, ceramics, semiconductors or metals, wherein said contaminant removing material is selected among the group of materials consisting of getter materials and drier materials; and
covering said contaminant removing material by a manufacturing layer, wherein said manufacturing layer is a substrate layer which may be used in the manufacture of said microdevice; and
removing selected materials in said manufacturing layer creating a passage in said manufacturing layer, such that said contaminant removing material is exposed to atmosphere, wherein said passages create cavities.
0 Assignments
0 Petitions
Accused Products
Abstract
The specification teaches a technique for manufacturing microelectronic, microoptoelectronic or micromechanical devices (microdevices) in which a contaminant absorption layer improves the life and operation of the microdevice. In an embodiment, a process for manufacturing the devices includes efficiently integrating a getter material.
-
Citations
21 Claims
-
1. A process for manufacturing a device for use in the production of a microdevice including the steps of:
-
creating a support device by deposing discrete deposits of contaminant removing material on a base layer of a material selected from the group consisting of glasses, ceramics, semiconductors or metals, wherein said contaminant removing material is selected among the group of materials consisting of getter materials and drier materials; and
covering said contaminant removing material by a manufacturing layer, wherein said manufacturing layer is a substrate layer which may be used in the manufacture of said microdevice; and
removing selected materials in said manufacturing layer creating a passage in said manufacturing layer, such that said contaminant removing material is exposed to atmosphere, wherein said passages create cavities. - View Dependent Claims (2, 3)
-
-
4. A process comprising:
-
creating a support device by deposing discrete deposits of contaminant removing material on a base layer of a material selected from the group consisting of glasses, ceramics, semiconductors or metals, wherein said contaminant removing material is selected among the group of materials consisting of getter materials and drier materials;
covering said contaminant removing material by a manufacturing layer, wherein said manufacturing layer is a substrate layer which may be used in the manufacture of said microdevice;
removing selected portions of said manufacturing layer creating a passage in said manufacturing layer, such that said contaminant removing material is exposed to atmosphere, wherein said passages create cavities. - View Dependent Claims (5, 6, 7, 8, 9)
-
-
10. A method for providing multiple microdevices comprising:
-
forming a first base, including a plurality of microdevice bases, where each microdevice base is provided with at least one component;
forming a second base, including a plurality of covers, where each cover is provided with a recess holding getter material;
juxtaposing the first base and the second base to form a compound structure;
separating the microdevices from the compound structure. - View Dependent Claims (11, 12, 13, 14)
-
-
15. A method comprising:
-
forming a base, including a plurality of covers, where each cover is provided with a recess holding getter material;
forming on the base a production process-compatible layer of a material compatible with the production of microelectronic or micromechanical devices or parts thereof;
providing the base in a production process in which passages are formed in the production process-compatible layer. - View Dependent Claims (16, 17, 18, 19, 20, 21)
-
Specification