Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion CVD

• US 20050181130A1
• Filed: 11/24/2004
• Published: 08/18/2005
• Est. Priority Date: 12/15/2003
• Status: Active Grant

• Current Assignee: Guardian Glass LLC (KOCH Industries Incorporated)
• Original Assignee: Guardian Industries Corporation (KOCH Industries Incorporated)
• Inventors: Thomsen, Scott V., Petrmichl, Rudolph Hugo, Murphy, Nestor P., Veerasamy, Vijayen S.
• Granted Patent: US 7,387,816 B2
• Time in Patent Office: Days
• US Class Current: 427/249.700
• CPC Class Codes: C03C 17/22 with other inorganic material C03C17/34, C03C17/44 take precedence
• CPC Class Codes: C03C 17/225 Nitrides
• CPC Class Codes: C03C 17/23 Oxides C03C17/02 takes precedence
• CPC Class Codes: C03C 17/245 by deposition from the vapour phase
• CPC Class Codes: C03C 17/2453 Coating containing SnO2
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/3441 comprising carbon, a carbide or oxycarbide
• CPC Class Codes: C03C 17/3452 comprising a fluoride
• CPC Class Codes: C03C 2217/215 In2O3
• CPC Class Codes: C03C 2217/218 V2O5, Nb2O5, Ta2O5
• CPC Class Codes: C03C 2217/228 Other specific oxides
• CPC Class Codes: C03C 2217/281 Nitrides
• CPC Class Codes: C03C 2217/282 Carbides, silicides
• CPC Class Codes: C03C 2217/285 Fluorides
• CPC Class Codes: C03C 2218/15 from the vapour phase
• CPC Class Codes: C03C 2218/154 by sputtering
• CPC Class Codes: C23C 14/024 Deposition of sublayers, e.g. to promote adhesion of the coating C23C14/027 takes precedence
• CPC Class Codes: C23C 14/06 characterised by the coating material C23C14/0021 , C23C14/04 take precedence
• CPC Class Codes: C23C 14/0635 Carbides
• CPC Class Codes: C23C 14/08 : Oxides C23C14/10 takes precedence
• CPC Class Codes: C23C 14/086 : of zinc, germanium, cadmium, indium, tin, thallium or bismuth
• CPC Class Codes: C23C 14/58 : After-treatment
• CPC Class Codes: Y10T 428/265 : 1 mil or less
• CPC Class Codes: Y10T 428/30 : Self-sustaining carbon mass or layer with impregnant or other layer
• CPC Class Codes: Y10T 428/31612 : As silicone, silane or siloxane

Abstract

A scratch resistant coated article is provided which is also resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass substrate from attacks by fluoride-based etchant(s), and an underlayer(s) deposited by flame pyrolysis may be provided under at least the anti-etch layer(s).

Claims

1. A method of making a coated article, the method comprising:

providing a glass substrate;

using flame pyrolysis to deposit at least one layer on the glass substrate; and

forming an anti-etch layer on the glass substrate over the flame pyrolysis deposited layer.

2. The method of claim 1, wherein the flame pyrolysis is used to deposit a layer comprising silicon oxide on the glass substrate.

3. The method of claim 2, wherein the silicon oxide layer is in direct contact with the glass substrate.

4. The method of claim 2, wherein the flame pyrolysis uses TEOS gas that is introduced into at least one burner to deposit the layer comprising silicon oxide.

5. The method of claim 1, wherein the anti-etch layer comprises cerium oxide and/or indium oxide.

6. The method of claim 1, wherein the flame pyrolysis is performed at atmospheric pressure.

7. The method of claim 1, wherein the anti-etch layer comprises zirconium.

8. The method of claim 1, wherein said step of forming the anti-etch layer comprises sputtering a target comprising zirconium in an atmosphere comprising oxygen and carbon so as to form the anti-etch layer in a manner so the anti-etch layer comprises zirconium oxycarbide.

9. The method of claim 8, wherein said sputtering of the target comprising zirconium is performed in an atmosphere comprising oxygen, carbon and hydrogen, so as to form the anti-etch layer so as to comprise hydrogenated zirconium oxycarbide.

10. The method of claim 9, wherein hydrogen content of the anti-etch layer comprising hydrogenated zirconium oxycarbide is from about 1-40%.

11. The method of claim 9, wherein hydrogen content of the anti-etch layer comprising hydrogenated zirconium oxycarbide is from about 5-35%.

12. The method of claim 9, wherein hydrogen content of the anti-etch layer comprising hydrogenated zirconium oxycarbide is from about 5-25%.

13. The method of claim 8, wherein said atmosphere further comprises nitrogen so that the layer comprises zirconium carbide oxynitride.

14. The method of claim 8, further comprising introducing an inert gas and a hydrocarbon gas into the atmosphere during said sputtering.

15. The method of claim 14, wherein the inert gas comprises argon and the hydrocarbon gas comprises acetylene (C₂H₂).

16. The method of claim 8, further comprising introducing an inert gas and CO₂ gas into the atmosphere during said sputtering.

17. The method of claim 8, wherein no or substantially no pure oxygen gas (O₂) is introduced into the atmosphere during said sputtering.

18. The method of claim 8, wherein an inert gas and a gas comprising carbon are introduced into the atmosphere during said sputtering, and wherein more of the inert gas than the gas comprising carbon is introduced into the atmosphere during said sputtering.

19. The method of claim 1, wherein the coated article is a window.

20. The method of claim 1, wherein the coated article has a visible transmission of at least about 50%.

21. The method of claim 1, further comprising ion beam depositing a layer comprising diamond-like carbon (DLC) on the glass substrate over the anti-etch layer.

22. The method of claim 1, wherein the anti-etch layer is resistant to corrosion by fluoride inclusive etchants.

23. The method of claim 1, wherein the anti-etch layer is at least about 2,500 Å

thick.

24. A coated article comprising:

a substrate;

an underlayer comprising silicon oxide on the substrate; and

an anti-etch layer comprising at least one material selected from the group consisting of;

zirconium oxycarbide, tin oxycarbide, indium oxide and cerium oxide; and

wherein the anti-etch layer is on the substrate over at least the underlayer comprising silicon oxide, and wherein the anti-etch layer is resistant to at least some fluoride-based glass etchants.

25. The coated article of claim 24, wherein the anti-etch layer comprises zirconium oxycarbide, and wherein the substrate is a glass substrate.