Apparatus for forming an asymmetric illumination beam pattern

• US 20050205878A1
• Filed: 02/28/2005
• Published: 09/22/2005
• Est. Priority Date: 02/26/2004
• Status: Active Grant

• Current Assignee: Signify Holding B.V. (Signify N.V.)
• Original Assignee: Koninklijke Philips Electronics N.V. (Koninklijke Philips N.V.)
• Inventors: Kan, Peter
• Granted Patent: US 7,652,300 B2
• Time in Patent Office: Days
• US Class Current: 257/80
• CPC Class Codes: F21S 4/20 with light sources held by or within elongate supports
• CPC Class Codes: F21V 13/02 Combinations of only two kinds of elements
• CPC Class Codes: F21V 5/002 using microoptical elements for redirecting or diffusing light
• CPC Class Codes: F21V 5/045 the lens having discontinuous faces, e.g. Fresnel lenses
• CPC Class Codes: F21V 7/0025 Combination of two or more reflectors for a single light source array of reflectors for a cluster of light sources F21V7/0083
• CPC Class Codes: F21V 7/0091 using total internal reflection
• CPC Class Codes: F21V 7/06 with parabolic curvature
• CPC Class Codes: F21V 7/09 with a combination of different curvatures
• CPC Class Codes: F21Y 2115/10 Light-emitting diodes [LED]
• CPC Class Codes: G02B 19/0028 refractive and reflective surfaces, e.g. non-imaging catadioptric systems
• CPC Class Codes: G02B 19/0066 in the form of an LED array
• CPC Class Codes: G09F 13/22 electroluminescent electroluminescent light sources per se H05B33/00
• CPC Class Codes: G09F 9/313 being gas discharge devices G09F9/302 takes precedence; gas discharge panels comprising a number of discharge gaps per se H01J17/49
• CPC Class Codes: G09F 9/33 being semiconductor devices, e.g. diodes

Abstract

The present invention provides an apparatus for forming an asymmetric illumination beam pattern that can be advantageous when illuminating channel letters in addition to enabling the creation of cove lighting, as well as other applications benefiting from asymmetric illumination patterns. The apparatus comprises one or more light-emitting elements for creating the illumination. A first optical element is operatively associated with each of the light-emitting elements and provides a means for manipulating the illumination in a first direction. A second optical element is operatively associated with predetermined light-emitting elements and provides a means for manipulating the illumination in a second direction. Upon the interaction of the illumination with both the first and second optical elements, the illumination being created can have an asymmetric beam pattern.

Claims

1. An apparatus for forming an asymmetric beam pattern for illumination generated by one or more light-emitting elements, said apparatus comprising:

a) a first optical element optically connected with each of the one or more light-emitting elements, said first optical element manipulating the illumination in a first direction;

b) a second optical element optically connected with one or more predetermined light-emitting elements selected from the one or more light-emitting elements, said second optical element for manipulating the illumination created by the one or more predetermined light-emitting elements in a second direction;

thereby forming an asymmetric illumination beam pattern.

2. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said illumination has a beam spread and said first optical element reduces the beam spread in the first direction and said second optical element increases beam spread in said second direction.

3. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said illumination has a beam spread and said first optical element increases the beam spread in the first direction and said second optical element decreases beam spread in said second direction.

4. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said first direction is perpendicular to said second direction.

5. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said first optical element manipulates the illumination prior to the second optical element.

6. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said first optical element manipulates the illumination subsequent to the second optical element.

7. The apparatus for forming an asymmetric beam pattern according to claim 2, wherein said first optical element has a cross sectional size larger than that of one of the light-emitting elements.

8. The apparatus for forming an asymmetric beam pattern according to claim 2, wherein said second optical element has a cross sectional size substantially similar to that of one of light-emitting elements.

9. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said first optical element is one or more optics selected from the group comprising lenticular lens, reflector, parabolic reflector, Fresnel lens and a pillow lens.

10. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said second optical element is one or more optics selected from the group comprising lenticular lens, toroidal shaped lens, TIR light guide, reflector, parabolic reflector and a Fresnel lens.

11. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said second optical element is a Fresnel lens having a surface, said surface comprising a series of concentric grooves.

12. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said second optical element is a Fresnel lens having a surface defined by quadrants, each quadrant of said surface comprising a series of arc shaped grooves.

13. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said beam pattern is rectangular or square.

14. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said second optical element is formed comprising multiple Fresnel lenses, each Fresnel lens configured to refract the illumination to different levels.

15. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said first optical element and second optical element are formed as an integrated unit.

16. The apparatus for forming an asymmetric beam pattern according to claim 1, further comprising a diffusive optic for manipulating the illumination subsequent to both the first optical element and said second optical element, said diffusive optic selected from the group comprising frosted glass, etched glass, plastic diffuser and holographically-mastered diffusion film.

17. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said first optical element is a parabolic reflector, said parabolic reflector comprising two or more surfaces having different tilt angles.

18. The apparatus for forming an asymmetric beam pattern according to claim 1, wherein said first optical element and said second optical element are rotated as a single unit relative to the one or more light-emitting elements.