Wafer dryer and method for drying a wafer

  • US 20050257396A1
  • Filed: 03/09/2005
  • Published: 11/24/2005
  • Est. Priority Date: 03/09/2004
  • Status: Active Grant
First Claim
Patent Images

1. A wafer dryer comprising:

  • a wafer bath vessel having means for supporting at least one wafer having an exposed surface to be dried; and

    a tub mounted to the bath vessel, the tub having a drying liquid spray device and a non-reactive carrier gas spray device opposing the drying liquid spray device, the spray device emitting a stream of pressurized drying liquid that converges with a stream of opposed pressurized non-reactive carrier gas emitted by the spray device of pressurized non-reactive gas to produce a drying liquid fog, the tub also having means for venting the drying liquid fog into the wafer bath vessel, the drying liquid fog drying the wafer.

View all claims

    Thank you for your feedback