Wafer dryer and method for drying a wafer

  • US 20050257396A1
  • Filed: 03/09/2005
  • Published: 11/24/2005
  • Est. Priority Date: 03/09/2004
  • Status: Active Grant
First Claim
Patent Images

1. A wafer dryer comprising:

  • a wafer bath vessel having means for supporting at least one wafer having an exposed surface to be dried; and

    a tub mounted to the bath vessel, the tub having a drying liquid spray device and a non-reactive carrier gas spray device opposing the drying liquid spray device, the spray device emitting a stream of pressurized drying liquid that converges with a stream of opposed pressurized non-reactive carrier gas emitted by the spray device of pressurized non-reactive gas to produce a drying liquid fog, the tub also having means for venting the drying liquid fog into the wafer bath vessel, the drying liquid fog drying the wafer.

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