Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus

• US 20050264780A1
• Filed: 06/10/2005
• Published: 12/01/2005
• Est. Priority Date: 12/10/2002
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: Carl Zeiss AG (Carl-Zeiss-Stiftung)
• Inventors: Graeupner, Paul
• Granted Patent: US 7,227,616 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/706 Aberration measurement
• CPC Class Codes: G03F 7/70891 Temperature

Abstract

A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.

Claims

1. A method for improving an optical imaging property of a projection objective which is part of a microlithographic projection exposure apparatus for projecting a reticle, arranged in an object plane of the projection objective, onto a photosensitive surface that is arranged in an image plane of the projection objective, said method comprising the following steps:

a) introducing an immersion liquid into an interspace between the photosensitive surface and an end face of the projection objective, which faces the photosensitive surface;

b) determining an imaging property of the projection objective;

c) comparing the imaging property determined in step b) with a target imaging property;

d) changing the temperature of the immersion liquid until the imaging property as determined in step b) is as close as possible to the target imaging property.

2. The method of claim 1, wherein the imaging property is determined by projecting a test reticle onto a photosensitive element arranged in the image plane.

3. The method of claim 2, wherein the photosensitive element is a sensor device.

4. The method of claim 3, wherein the sensor device is a CCD sensor.

5. The method of claim 1, wherein the imaging property is determined by using an interferometer.

6. The method of claim 1, wherein the optical imaging property is the spherical aberration caused by the projection objective.

7. The method of claim 1, wherein the optical imaging property is the focal length of the projection objective.

8. A microlithographic projection exposure apparatus, comprising:

a) a projection objective having an object plane and an image plane and which is configured for projecting a reticle arranged in the object plane onto a photosensitive surface arranged in the image plane,

b) a filling device for introducing an immersion liquid into an interspace formed between the photosensitive surface and an end face of the projection objective,

c) a sensor device which is configured to be arranged in the image plane of the projection objective,

d) a temperature control device for setting a target temperature of the immersion liquid, and

e) a computer unit which is connected to the temperature control device and which is adapted to determine the target temperature of the immersion liquid from signals generated by the sensor device.

9. The apparatus of claim 8, wherein the sensor device comprises a CCD sensor.

10. A microlithographic projection exposure apparatus, comprising:

a) a projection objective having an object plane and an image plane and which is configured for projecting a reticle arranged in the object plane onto a photosensitive surface arranged in the image plane,

b) an immersion liquid in an interspace between the photosensitive surface and an end face of the projection objective, said immersion liquid having a temperature that is selected such that the immersion liquid compensates for an aberration of the projection objective.

11. The apparatus of claim 10, wherein the aberration is a spherical aberration.