Transparent article having protective silicon nitride film
First Claim
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1. A method of making a transparent article comprising:
- providing a transparent, non-metallic substrate; and
depositing upon the substrate, in sequence, a first dielectric film, a metal film, a second dielectric film of a metal oxide, and a protective film of silicon nitride having a thickness in the range of 10 to 150 Å
.
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Abstract
Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 Å to 150 Å in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.
76 Citations
18 Claims
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1. A method of making a transparent article comprising:
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providing a transparent, non-metallic substrate; and
depositing upon the substrate, in sequence, a first dielectric film, a metal film, a second dielectric film of a metal oxide, and a protective film of silicon nitride having a thickness in the range of 10 to 150 Å
. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of making a transparent article comprising:
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providing a transparent, non-metallic substrate; and
depositing upon the substrate, in sequence, a dielectric film contiguous to the transparent substrate, a metal film, a shielding film contiguous to the metal film, a metal oxide film, and a protective film of from 10 Å
to 150 Å
of silicon nitride contiguous to said metal oxide film. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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Specification