Optical position assessment apparatus and method

• US 20050275840A1
• Filed: 05/27/2004
• Published: 12/15/2005
• Est. Priority Date: 05/27/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: de Jager, Pieter Willem Herman, Gui, Cheng-Qun, Bijnen, Fransiscus Godefridus Casper, Hoefnagels, Johan Christiaan Gerard, de Smit, Joannes Theodoor
• Granted Patent: US 7,477,403 B2
• Time in Patent Office: Days
• US Class Current: 356/400
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Abstract

An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A substrate is supported on a substrate table and a projection system is used to project the alignment beam onto a target portion of the substrate. A positioning system causes relative movement between the substrate and the projection system. An array of lenses is arranged such that each lens in the array focuses a respective portion of the alignment beam onto a respective part of the target portion. An array of detectors is arranged such that each detector in the array detects light reflected from the substrate through a respective lens in the array and provides an output representative of the intensity of light reflected to it from the substrate through the respective lens. A processor is connected to the outputs of the detectors for deriving data representing the position of the lens array relative to the substrate from the outputs of the detectors.

Claims

1. An optical position measurement apparatus, comprising:

an illumination system that supplies a beam of radiation;

a substrate table that supports a substrate;

a projection system that projects the beam of radiation onto a target portion of the substrate;

a positioning system that causes relative movement between the substrate and the projection system; and

a measurement system that determines a position of at least a component of the projection system relative to the substrate, the measurement system comprising,

an array of lenses arranged such that each lens in the array focuses a respective portion of the beam onto a respective part of the target portion,

an array of detectors arranged such that each detector in the array detects light reflected from the substrate through a respective lens in the array and provides an output representative of an intensity of light reflected to the detector from the substrate through the respective lens, and

a processor connected to the outputs of the detectors for deriving data representing the position of the lens array relative to the substrate from the outputs of the detectors.

2. The apparatus according to claim 1, wherein the processor is arranged to determine characteristics of regions of the substrate beneath the lens array from the detected intensities and to derive a measure of the position of the substrate from the detected intensities.

3. The apparatus according to claim 2, wherein the processor is arranged to derive an intensity pattern corresponding to the detected intensities, to compare the derived intensity pattern with a stored intensity pattern corresponding to an alignment pattern, and to determine the position of the substrate relative to the lens array from the position of lenses within the lens array from which a pattern is derived, which is the same as the stored intensity pattern.

4. The apparatus according to claim 3, wherein the processor is arranged to provide a fault-indicating output if no pattern is derived that is the same as the stored intensity pattern.

5. The apparatus according to claim 1, wherein the lens array is a component of a lithographic apparatus comprising a device that patterns an exposure beam, which is projected onto the substrate.

6. The apparatus according to claim 5, wherein:

an exposure illumination source for generating the patterned exposure beam; and

an alignment illumination source for generating the beam of radiation;

wherein

the patterned exposure beam and the beam of radiation have different wavelengths.

7. The apparatus according to claim 6, wherein the projection system projects both the beam of radiation and the patterned exposure beam to the array of lenses.

8. The apparatus according to claim 6, wherein the projection system comprises:

first and second projection systems corresponding to the beams of radiation and the patterned exposure beam, respectively, the first and second projecting systems projection the beam of radiation and the patterned exposure beam to the array of lenses.

9. The apparatus according to claim 6, wherein the beam of radiation is projected onto a peripheral section of the array of lenses.

10. The apparatus according to claim 6, wherein:

the projection system comprises first and second projection systems corresponding to the beams of radiation and the patterned exposure beam, respectively; and

the array of lenses comprises first and second arrays of lenses, such that the first and second projection systems project the beam of radiation and the patterned exposure beam onto respective ones of the array of lenses.

11. The apparatus according to claim 6, further comprising:

an alignment scanning control system that controls scanning of a surface of the substrate with the beam of radiation and storing outputs from the detectors; and

an exposure control system that corrects the position of the substrate relative to the array of lenses during substrate exposure in dependence upon the stored outputs.

12. The apparatus according to claim 11, wherein the exposure control system:

compares a predetermined pattern of detector outputs corresponding to a pattern to be detected on the substrate with the stored detector outputs;

determines the position of the substrate relative to the lens array from the position relative to the array of lenses of a pattern which is the same as the predetermined pattern;

compares the determined position with a nominal position of the substrate; and

corrects for any difference between the determined and nominal positions.

13. The apparatus according to claim 12, wherein the predetermined pattern comprises:

an array of features with a pitch equal to the pitch of lenses of the array of lenses associated with the detectors of the reflected light.

14. The apparatus according to claim 13, wherein the predetermined pattern comprises an array of spots.

15. The apparatus according to claim 13, wherein the predetermined pattern comprises an array of lines.

16. The apparatus according to claim 13, wherein the predetermined pattern comprises features with different spacings between adjacent features.

17. The apparatus according to claim 5, wherein the patterned exposure beam and the beam of radiation are generated from a common source.

18. The apparatus according to claim 1, wherein at least one detector comprises at least two sub-detectors arranged to detect non-uniform illumination of the detector.

19. The apparatus according to claim 1, wherein:

at least one detector is arranged such that only if a spacing between the substrate and the associated lens of the array is not correct will light reflected through the associated lens be incident upon the at least one detector; and

the processor is arranged to detect an incorrect spacing between the substrate and the array of lenses if light of a predetermined minimum intensity is incident upon the at least one detector.

20. The apparatus according to claim 19, wherein:

at least two detectors are arranged such that only if the spacing between the substrate and the associated lenses of the array is not correct will light reflected through the associated lenses be incident upon the detectors; and

the processor is arranged to correct the spacing between the substrate and the lens array, so as to level the array of lenses relative to the substrate if light of a predetermined minimum intensity is incident upon any one of the at least two detectors.

21. The apparatus according to claim 19, wherein the detector is annular so as to define an opening through which the respective portion of the alignment beam is projected onto the respective lens of the array.

22. The apparatus according to claim 1, further comprising:

a system that supplies an exposing beam of radiation, wherein the array of lenses is arranged to focus the exposing beam on the substrate.

23. An optical position measuring method, comprising:

producing an alignment beam of radiation;

projecting the alignment beam from a projection system onto a target portion of a substrate;

moving at least one of the substrate and the projection system relative to the other; and

determining a position of at least a component of the projection system relative to the substrate, the determining step comprising,

illuminating an array of lenses arranged such that each lens in the array focuses a respective portion of the alignment beam onto a respective part of the target portion,

detecting light reflected from the substrate through each respective lens in the array and providing an output representative of a detected intensity of light reflected from the substrate through each lens, and

deriving data representing a position of the array of lenses relative to the substrate from the outputs.

24. The method according to claim 23, further comprising:

determining characteristics of regions of the substrate beneath the array of lenses from the detected intensities; and

deriving a measurement of the position of the substrate from the detected intensities.

25. The method according to claim 24, further comprising:

deriving an intensity pattern corresponding to the detected intensities;

comparing the derived intensity pattern with a stored intensity pattern corresponding to an alignment pattern; and

determining the position of the substrate relative to the lens array from the position of lenses within the array of lenses.

26. The method according to claim 25, further comprising:

providing a fault-indicating output if no pattern is derived which is the same as the stored intensity pattern.

27. The method according to claim 23, further comprising:

patterning an exposure beam.

28. The method according to claim 27, further comprising:

generating the patterned exposure beam from an exposure illumination source;

generating the alignment beam from an alignment illumination source, wherein the sources produce beams of different wavelengths.

29. The method according to claim 28, further comprising:

projecting the alignment and patterned exposure beams using the projection system from the sources to the array of lenses.

30. The method according to claim 28, further comprising:

projecting the alignment and patterned exposure beams using first and second projection devices in the projection system from the sources to the array of lenses.

31. The method according to claim 28, further comprising:

projecting the alignment beam onto a peripheral section of the array of lenses.

32. The method according to claim 28, further comprising:

projecting the alignment and patterned exposure beams using separate devices in the projection system from the sources to separate and respective lens arrays in the array of lenses.

33. The method according to claim 28, further comprising

scanning a surface of the substrate with the alignment beam;

storing outputs from the detectors; and

controlling the position of the substrate relative to the array of lenses during substrate exposure based on the storing step.

34. The method according to claim 33, further comprising:

comparing a predetermined pattern of detector outputs corresponding to a pattern to be detected on the substrate to the stored detector outputs;

determining the position of the substrate relative to the array of lenses from the position relative to the array of lenses of a pattern which is the same as the predetermined pattern;

comparing the determined position to a nominal position of the substrate; and

correcting a position of the substrate to compensate for any difference between the determined and nominal positions.

35. The method according to claim 34, further comprising:

forming the predetermined pattern to provide an array of features with a pitch equal to the pitch of lenses of the array of lenses associated with detectors of the reflected light.

36. The method according to claim 33, further comprising using an array of spots as the predetermined pattern.

37. The method according to claim 33, further comprising using an array of lines as the predetermined pattern.

38. The method according to claim 35, further comprising using features with different spacing between adjacent features as the predetermined pattern.

39. The method according to claim 27, further comprising generating the patterned exposure beam and the alignment beam from a common source.

40. The method according to claim 23, further comprising:

using at least two sub-detectors for at least one detector; and

monitoring outputs of the sub-detectors to detect non-uniform illumination of the detector.

41. The method according to claim 23, further comprising:

arranging at least one detector, such that only if a spacing between the substrate and an associated lens of the array of lenses is not correct will light reflected through the associated lens be incident upon the at least one detector and an incorrect spacing between the substrate and the lens array is indicated if light of a predetermined minimum intensity is incident upon the at least one detector.

42. The method according to claim 23, further comprising:

arranging at least two detectors, such that only if the spacing between the substrate and the associated lenses of the array corresponding to the at least two detectors is not correct will light reflected through the associated lenses be incident upon the detectors; and

correcting the spacing between the substrate and the lens array so as to level the array of lenses relative to the substrate if light of a predetermined minimum intensity is incident upon any one of the at least two detectors.

43. The method according to claim 41, further comprising:

projecting a respective portion of the alignment beam onto the respective lens of the array of lenses through an opening defined in the detector.

44. The method according to claim 23, further comprising

generating an exposing beam of radiation;

and

projecting the exposing beam of radiation onto the substrate through the array of lenses.