Method for fabricating trench power device
First Claim
1. A method for forming an oxide layer at the bottom of a trench, the method comprising:
- providing a first substrate with at least one trench therein;
forming a first oxide layer on the bottom and sidewalls of the trench;
removing the first oxide layer at the bottom of the trench; and
forming a second oxide layer at the bottom of the trench.
1 Assignment
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Accused Products
Abstract
Embodiments of the invention relate to a fabrication method of an electronic device, more particularly to a fabrication method of a power device in which an oxide layer at the bottom of the trench is provided to reduce Miller capacitance and further reduce RC delay. In one embodiment, a method for forming an oxide layer at the bottom of a trench comprises providing a first substrate with at least one trench therein; forming a first oxide layer on the bottom and sidewalls of the trench; removing the first oxide layer at the bottom of the trench; and forming a second oxide layer at the bottom of the trench.
7 Citations
52 Claims
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1. A method for forming an oxide layer at the bottom of a trench, the method comprising:
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providing a first substrate with at least one trench therein;
forming a first oxide layer on the bottom and sidewalls of the trench;
removing the first oxide layer at the bottom of the trench; and
forming a second oxide layer at the bottom of the trench. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A method for fabricating a power device, the method comprising:
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providing a substrate;
forming a third oxide layer on the substrate;
forming a silicon nitride layer on the third oxide layer;
patterning the silicon nitride layer and the third oxide layer to form an opening;
etching the substrate along the opening to form a trench therein;
forming a first oxide layer on the bottom and sidewalls of the trench;
removing the first oxide layer at the bottom of the trench; and
forming a second oxide layer at the bottom of the trench. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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36. A method for fabricating a power device, the method comprising:
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providing a substrate;
forming a third oxide layer on the substrate;
forming a silicon nitride layer on the third oxide layer;
patterning the silicon nitride layer and the third oxide layer to form an opening;
etching the substrate along the opening to form a trench therein;
forming a first oxide layer on the bottom and sidewalls of the trench;
removing the first oxide layer at the bottom of the trench;
forming a second oxide layer at the bottom of the trench;
removing the remaining silicon nitride layer; and
removing the first oxide on the sidewalls of the trench and the remaining third oxide layer. - View Dependent Claims (37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52)
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Specification