Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- an illumination system that supplies a beam of radiation;
a refraction grating that divides the beam into a plurality of sub-beams;
an array of individually controllable elements being configured such that the plurality of said sub-beams of radiation are directed onto associated individually controllable elements in said array of individually controllable elements to pattern the beam; and
a projection system that projects the patterned beam onto a target portion of a substrate.
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Abstract
Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.
35 Citations
13 Claims
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1. A lithographic apparatus, comprising:
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an illumination system that supplies a beam of radiation;
a refraction grating that divides the beam into a plurality of sub-beams;
an array of individually controllable elements being configured such that the plurality of said sub-beams of radiation are directed onto associated individually controllable elements in said array of individually controllable elements to pattern the beam; and
a projection system that projects the patterned beam onto a target portion of a substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A device manufacturing method, comprising:
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dividing a beam of radiation into a plurality of sub-beams using a refraction grating;
directing the plurality of said sub-beams of radiation onto associated individually controllable elements in an array of individually controllable elements;
using said array of individually controllable elements to pattern each respective one of the plurality of said sub-beams; and
projecting the patterned beams onto a target portion of a substrate.
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Specification