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Apparatus for forming a polishing pad having a reduced striations

  • US 20060067160A1
  • Filed: 09/30/2004
  • Published: 03/30/2006
  • Est. Priority Date: 09/30/2004
  • Status: Active Grant
First Claim
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1. An apparatus for forming a striation-reduced chemical mechanical polishing pad, comprising:

  • a first delivery line for delivering a polymeric material into a mixer;

    a second delivery line for delivering microspheres having an initial bulk density into the mixer with the polymeric material, the second delivery line being connected to a bulk density control unit, the bulk density control unit comprising;

    a storage hopper for storing the microspheres, wherein the storage hopper further comprises a porous membrane provided over a plenum;

    a fluidizing gas source connected to the plenum through a gas inlet line; and

    wherein gas fed into the plenum from the fluidizing gas source permeates through the porous membrane and reduces the initial bulk density of the microspheres in the storage hopper.

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