Method for smoothing and polishing surfaces by treating them with energetic radiation
First Claim
1. A method for smoothing and polishing surfaces by treating them with energetic radiation (3), in particular laser radiation, in which the to-be-smoothed surface (1) is remelted in a first treatment step using said energetic radiation (3) and employing first treatment parameters at least once down to a first remelting depth (10), which is greater than a structural depth of the to-be-smoothed structures of said to-be-smoothed surface and is ≦
- 100 μ
m, wherein in said first treatment step continuous energetic radiation or pulsed energetic radiation with a pulse duration of ≧
100 μ
s is employed and said surface (1) is remelted down to a first remelting depth (10) of 5 to 100 μ
m.
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Accused Products
Abstract
The present invention relates to a method for smoothing and polishing surfaces by treating them with energetic radiation, in particular laser radiation, in which the to-be-smoothed surface (1) is remelted in a first treatment step using said energetic radiation (3) and employing first treatment parameters at least once down to a first remelting depth (10) of approx. 5 to 100 μm, which is greater than a structural depth of the to-be-smoothed structures of said to-be-smoothed surface (1), wherein continuous radiation or pulsed radiation (3) with a pulse duration of ≧100 μs is employed. The method makes it possible to automatically polisch any three-dimensional surface fast and cost effective.
39 Citations
16 Claims
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1. A method for smoothing and polishing surfaces by treating them with energetic radiation (3), in particular laser radiation, in which the to-be-smoothed surface (1) is remelted in a first treatment step using said energetic radiation (3) and employing first treatment parameters at least once down to a first remelting depth (10), which is greater than a structural depth of the to-be-smoothed structures of said to-be-smoothed surface and is ≦
- 100 μ
m, whereinin said first treatment step continuous energetic radiation or pulsed energetic radiation with a pulse duration of ≧
100 μ
s is employed and said surface (1) is remelted down to a first remelting depth (10) of 5 to 100 μ
m. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
- 100 μ
Specification