Exposure apparatus, and device manufacturing method

• US 20060132740A1
• Filed: 01/27/2006
• Published: 06/22/2006
• Est. Priority Date: 06/19/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Ebihara, Akimitsu
• Granted Patent: US 8,018,575 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G03F 7/70225 Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
• CPC Class Codes: G03F 7/70325 Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
• CPC Class Codes: G03F 7/70333 Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
• CPC Class Codes: G03F 7/70816 Bearings
• CPC Class Codes: Y10T 29/49826 Assembling or joining

Abstract

An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. The projection system is maintained in contact with the immersion liquid after the substrate has been moved away from under the projection system.

Claims

1. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide an immersion liquid, through which said beam is to be projected, in a space between said projection system and said substrate; and

a shutter configured to keep said projection system in contact with liquid when said substrate is moved away from under said projection system.

2. An apparatus according to claim 1, wherein said shutter is positionable on a side of said supply system opposite said projection system such that liquid can be confined in said liquid supply system and between said projection system and said shutter.

3. An apparatus according to claim 2, wherein said shutter is separable from the remainder of said apparatus.

4. An apparatus according to claim 3, comprising an attachment device configured to releasably attach said shutter to said liquid supply system.

5. An apparatus according to claim 4, wherein said attachment device comprises a vacuum outlet configured to attract said shutter to said liquid supply system.

6. An apparatus according to claim 5, wherein said liquid supply system comprises a liquid confinement structure which extends along at least part of the boundary of said space to contain said immersion liquid and which comprises a low pressure outlet configured to seal between said structure and said substrate, said low pressure outlet forming at least part of said attachment device.

7. An apparatus according to claim 2, wherein, in a stowed position, said shutter has a primary surface substantially co-planar with a surface of said substrate facing said projection system.

8. An apparatus according to claim 2, wherein said shutter comprises a guide mark.

9. An apparatus according to claim 8, comprising a sensor configured to measure a position of said shutter using said guide mark.

10. An apparatus according to claim 1, wherein the liquid supply system comprises a liquid confinement structure extending along at least a part of the boundary of said space between the final element and the substrate table.

11. An apparatus according to claim 1, wherein said liquid supply system comprises an outlet configured to remove liquid from said space.

12. An apparatus according to claim 2, wherein said lithographic apparatus comprises a controller configured to move at least one of the substrate table towards the liquid supply system and at least a portion of the liquid supply system towards the substrate table so that the shutter confines liquid in said liquid supply system.

13. An apparatus according to claim 1, wherein said liquid supply system comprises at least one inlet to supply said immersion liquid onto the substrate and at least one outlet to remove said immersion liquid after said liquid has passed under said projection system.

14. An apparatus according to claim 1, wherein said liquid supply system is configured to provide said liquid to a space between said projection system and said substrate.

15. A device manufacturing method comprising:

providing an immersion liquid to a space between a projection system and a substrate;

projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate using the projection system; and

maintaining said projection system in contact with liquid after said substrate has been moved away from under said projection system.

16. A method according to claim 15, wherein maintaining said projection system in contact with liquid comprises positioning a shutter on a side opposite said projection system such that liquid is confined between said projection system and said shutter.

17. A method according to claim 16, wherein said shutter is separable from the remainder of a lithographic apparatus.

18. A method according to claim 17, comprising releasably attaching said shutter to a liquid supply system used to provide said immersion liquid to said space.

19. A method according to claim 18, wherein releasably attaching comprises attaching said shutter using at least one of magnetic force and vacuum.

20. A method according to claim 16, comprising measuring a position of said shutter using a guide mark.

21. A method according to claim 16, wherein said shutter, when keeping said projection system in contact with liquid, is positioned opposite a liquid supply system used to provide said immersion liquid to said space.

22. A method according to claim 15, comprising removing liquid from said space.

23. A method according to claim 16, comprising moving at least one of a substrate table towards a liquid supply system used provide said liquid and at least a portion of said liquid supply system towards said substrate table so that the shutter confines liquid in said liquid supply system.

24. A method according to claim 15, wherein providing said immersion liquid comprises supplying said immersion liquid onto the substrate through at least one inlet and removing said immersion liquid, after said liquid has passed under said projection system, through at least one outlet.

25. A method according to claim 15, comprising providing said liquid to a space between a final lens of said projection system and said substrate.

26. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, the aperture having an area smaller than an area of the substrate, the patterned beam capable of being projected through liquid in the space and the aperture onto the substrate; and

a closure configured to selectively close and open the aperture, wherein the closure is separable from the remainder of the apparatus.

27. The apparatus according to claim 26, wherein the closure is positionable on a side of the liquid supply system opposite the projection system such that liquid can be confined in the liquid supply system and between the projection system and the closure.

28. The apparatus according to claim 26, wherein the liquid supply system comprises at least one inlet to supply liquid onto the substrate and at least one outlet to remove liquid after the liquid has passed under the projection system.

29. The apparatus according to claim 26, wherein the liquid supply system is configured to provide the liquid to a space between a final lens of the projection system and the substrate.

30. A device manufacturing method comprising:

providing a liquid to a space between a projection system and a substrate, the space having a selectively openable and closeable aperture thereto, the aperture having an area smaller than an area of the substrate;

projecting a patterned beam of radiation, through the liquid and the aperture, onto a target portion of the substrate using the projection system; and

selectively opening and closing the aperture with a closure, wherein the closure is separable from the remainder of a lithographic apparatus.

31. The method according to claim 30, wherein providing the liquid comprises supplying the liquid onto the substrate through at least one inlet and removing the liquid, after the liquid has passed under the projection system, through at least one outlet.

32. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and

a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate, wherein the shutter is separable from the remainder of the apparatus.

33. The apparatus according to claim 32, wherein the shutter is positionable on a side of the liquid supply system opposite the projection system such that liquid can be confined in the liquid supply system and between the projection system and the shutter.

34. The apparatus according to claim 32, wherein the liquid supply system comprises at least one inlet to supply the liquid onto the substrate and at least one outlet to remove the liquid after the liquid has passed under the projection system.

35. The apparatus according to claim 32, wherein the liquid supply system is configured to provide the liquid to a space between a final lens of the projection system and the substrate.