Electrochromic devices and methods

• US 20060209383A1
• Filed: 02/22/2006
• Published: 09/21/2006
• Est. Priority Date: 02/23/2005
• Status: Active Grant

• Current Assignee: Sage Electrochromics, Inc (Compagnie de Saint-Gobain SA)
• Original Assignee: Sage Electrochromics, Inc (Compagnie de Saint-Gobain SA)
• Inventors: Burdis, Mark Samuel, Weir, Douglas Glenn John
• Granted Patent: US 7,372,610 B2
• Time in Patent Office: Days
• US Class Current: 359/265
• CPC Class Codes: G02F 1/1524 Transition metal compounds
• CPC Class Codes: G02F 1/155 Electrodes
• CPC Class Codes: G02F 2001/1502 complementary cell

Abstract

A heat treated electrochromic device comprising an anodic complementary counter electrode layer comprised of a mixed tungsten-nickel oxide and lithium, which provides a high transmission in the fully intercalated state and which is capable of long term stability, is disclosed. Methods of making an electrochromic device comprising an anodic complementary counter electrode comprised of a mixed tungsten-nickel oxide are also disclosed.

Claims

1. A heat treated electrochromic device comprising:

a) a first electrode comprising one of a cathodic electrochromic layer or an anodic counter electrode layer,

b) a second electrode comprising other of said electrochromic layer or said anodic counter electrode layer,

c) an ion-conductor layer for conducting ions between said first and second electrodes,

d) a first conductive layer, and

e) a second conductive layer,

said first and second electrodes and said ion-conductor layer being sandwiched between said first and second conductive layers, and

said anodic counter electrode layer comprising lithium and a mixed tungsten-nickel oxide substantially in crystalline form.

2. The electrochromic device of claim 1, wherein an amount of nickel in said mixed tungsten-nickel oxide ranges from about 15% to about 90% by weight of said mixed tungsten-nickel oxide.

3. The electrochromic device of claim 2, wherein said amount ranges from about 30% to about 70% by weight of said mixed tungsten-nickel oxide.

4. The electrochromic device of claim 2, wherein said amount ranges from about 40% to about 60% by weight of said mixed tungsten-nickel oxide.

5. The electrochromic device of claim 1, wherein said cathodic electrochromic layer comprises a metal oxide.

6. The electrochromic device of claim 5, wherein said metal oxide is selected from the group consisting of tungsten oxide, vanadium oxide, molybdenum oxide, niobium oxide, titanium oxide, copper oxide, iridium oxide, chromium oxide, and manganese oxide.

7. The electrochromic device of claim 5, wherein said metal oxide is doped with one or more metals.

8. The electrochromic device of claim 1, wherein said first and second conductive layers comprise a metal oxide.

9. The electrochromic device of claim 8, wherein said metal oxide is selected from the group consisting of indium oxide, tin oxide, zinc oxide, and ruthenium oxide.

10. The electrochromic device of claim 8, wherein said metal oxide is doped with one or more metals.

11. The electrochromic device of claim 8, wherein said conductive layers comprise the same metal oxide.

12. The electrochromic device of claim 8, wherein said conductive layers comprise different metal oxides.

13. The electrochromatic device of claim 1, wherein said first and second conductive layers comprise a substantially transparent coating of a transition metal.

14. The electrochromic device of claim 1, wherein said ion conductor layer comprises a lithium-ion conducting layer.

15. The electrochromic device of claim 14, wherein said lithium-ion conducting layer comprises a material selected from the groups consisting of silicates, silicon oxides, and borates.

16. The electrochromic device of claim 1, disposed on a substrate selected from the group consisting of glass or plastic.

17. The electrochromic device of claim 1, wherein said anodic counter electrode has a substantially uniform thickness ranging from about 500 Angstroms to about 6500 Angstroms.

18. The electrochromic device of claim 17, wherein said thickness ranges from about 1500 Angstroms to about 2500 Angstroms.

19. A method for the preparation of an electrochromic device comprising:

a) providing a first conductive layer,

b) depositing one of an electrochromic layer or a counter electrode layer comprising a mixed tungsten-nickel oxide on said first conductive layer, thereby providing a first deposited electrode,

c) depositing an ion-conductor layer on said first deposited electrode,

d) depositing the other of said electrochromic layer or said counter electrode layer on said ion-conductor layer, thereby providing a second deposited electrode,

e) depositing a second conductive layer on said second deposited electrode,

f) heating said electrochromic device, and

g) depositing lithium onto said counter electrode layer whereby said mixed tungsten-nickel oxide is reduced.

20. The method of claim 19, wherein an amount of nickel in said mixed tungsten-nickel oxide ranges from about 15% to about 90% by weight of said mixed oxide.

21. The method of claim 20, wherein said amount ranges from about 30% to about 70% by weight of said mixed oxide.

22. The method of claim 20, wherein said amount ranges from about 40% to about 60% by weight of said mixed oxide.

23. The method of claim 19, wherein said electrochromic layer comprises a metal oxide.

24. The method of claim 23, wherein said metal oxide is selected from the group consisting of tungsten oxide, vanadium oxide, molybdenum oxide, niobium oxide, titanium oxide, iridium oxide, chromium oxide, copper oxide, and manganese oxide.

25. The method of claim 23, wherein said metal oxide is doped with one or more metals.

26. The method of claim 19, comprising depositing said lithium in an amount which provides a maximum transmission through said counter electrode layer.

27. The method of claim 19, comprising depositing said lithium in an amount in excess of said amount which provides a maximum transmission through said counter electrode layer.

28. The method of claim 27, wherein said excess amount ranges from about 10% to about 40% above said amount which provides a maximum transmission through said counter electrode layer.

29. The method of claim 19, comprising heating said electrochromic device to a temperature ranging from about 280°

C. to about 500°

C.

30. The method of claim 29, comprising heating said electrochromic device to a temperature ranging from about 355°

C. to about 395°

C.

31. The method of claim 29, comprising depositing said counter electrode layer by means of physical vapor deposition.

32. The method of claim 19, comprising depositing said counter electrode layer by means of intermediate frequency reactive sputtering.

33. The method of claim 19, comprising depositing said counter electrode layer by means of DC sputtering.

34. The method of claim 19, comprising depositing said lithium on said counter electrode layer by means of wet chemical methods.

35. The method of claim 19, comprising depositing said lithium on said counter electrode layer by means of physical vapor deposition.

36. A method of making a counter electrode layer for use in connection with an electrochromic device comprising:

a) depositing a film of mixed tungsten-nickel oxide on a substrate,

b) reducing said mixed tungsten-nickel oxide film by depositing lithium on said film, and

c) heating said counter electrode layer.

37. The method of claim 36, wherein an amount of nickel in said mixed tungsten-nickel oxide ranges from about 15% to about 90% by weight of said mixed oxide.

38. The method of claim 37, wherein said amount ranges from about 30% to about 70% by weight of said mixed oxide.

39. The method of claim 37, wherein said amount ranges from about 40% to about 60% by weight of said mixed oxide.

40. The method of claim 36, comprising depositing said lithium in an amount which provides a maximum transmission through said counter electrode layer.

41. The method of claim 36, comprising depositing said lithium in an amount in excess of said amount which provides a maximum transmission through said counter electrode layer.

42. The method of claim 41, wherein said excess amount ranges from about 10% to about 40% above said amount which provides a maximum transmission through said counter electrode layer.

43. The method of claim 36, comprising depositing said counter electrode layer by means of physical vapor deposition.

44. The method of claim 36, comprising depositing said counter electrode layer by means of intermediate frequency reactive sputtering.

45. The method of claim 36, comprising depositing said counter electrode layer by means of DC sputtering.

46. The method of claim 36, comprising depositing said lithium on said counter electrode layer by means of wet chemical methods.

47. The method of claim 36, comprising depositing lithium on said counter electrode layer by means of physical vapor deposition.