Process and apparatus for the manufacture of a sputtering target

  • US 20060233965A1
  • Filed: 02/23/2004
  • Published: 10/19/2006
  • Est. Priority Date: 02/24/2003
  • Status: Active Grant
First Claim
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1. A process for the manufacture of a sputtering target comprising:

  • i) providing a substrate having a coating-receiving surface;

    ii) plasma melting in-flight of a target material selected to form the sputtering target in powder form, yielding droplets of molten target material; and

    iii) deposition of said droplets onto said coating-receiving surface of said substrate, yielding a sputtering target comprised of a coated layer of said target material on said coating-receiving surface of said substrate.

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