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Acoustic wave etch rate sensor system

  • US 20060283249A1
  • Filed: 06/16/2005
  • Published: 12/21/2006
  • Est. Priority Date: 06/16/2005
  • Status: Active Grant
First Claim
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1. An acoustic wave sensor system for monitoring the etchability of a material exposed to an etchant, the sensor system comprising:

  • an acoustic wave sensing device having a piezoelectric substrate, and at least one electrode, coupled to said substrate, said at least one electrode being adapted and arranged to generate an acoustic wave propagating in the device upon application of a voltage potential and to transform the propagating wave into an output response, and a a selective material disposed on said substrate, said material being chemically reactive with said etchant such that said material is etchable by said etchant, whereby, said sensing device can provide an output response in which changes in frequency, phase or other propagation characteristics of said wave caused by etching of said selective material can be analyzed to evaluate the etching rate or etchability of said selective material.

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