Lithographic apparatus, method for calibrating and device manufacturing method
First Claim
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1. A method of calibrating a lithographic apparatus, comprising:
- (a) patterning a projection beam using an array of individually controllable elements;
(b) directing the patterned projection beam towards a substrate table using a projection system;
(c) locating a detector having a plurality of detector elements in a path of the patterned projection beam, each of the detector elements being larger than a spot corresponding to a single element of the array of individually controllable elements;
(d) selectively activating the detector elements;
(e) measuring an amount of radiation received on respective ones of the detector elements from the patterned projection beam; and
(f) calibrating the lithographic projection apparatus based on the measuring step (e).
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Abstract
To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
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8 Claims
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1. A method of calibrating a lithographic apparatus, comprising:
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(a) patterning a projection beam using an array of individually controllable elements;
(b) directing the patterned projection beam towards a substrate table using a projection system;
(c) locating a detector having a plurality of detector elements in a path of the patterned projection beam, each of the detector elements being larger than a spot corresponding to a single element of the array of individually controllable elements;
(d) selectively activating the detector elements;
(e) measuring an amount of radiation received on respective ones of the detector elements from the patterned projection beam; and
(f) calibrating the lithographic projection apparatus based on the measuring step (e). - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification