Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

• US 20070252965A1
• Filed: 07/10/2007
• Published: 11/01/2007
• Est. Priority Date: 04/11/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Binnard, Michael
• Granted Patent: US 8,514,367 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

Abstract

An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.

Claims

1. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide an immersion liquid, through which said beam is to be projected, in a space between said projection system and said substrate; and

a shutter configured to keep said projection system in contact with liquid when said substrate, at least while on the substrate table, substantially comes out of contact with the liquid.

2. An apparatus according to claim 1, wherein said shutter is positionable on a side of said supply system opposite said projection system such that liquid can be confined in said liquid supply system and between said projection system and said shutter.

3. An apparatus according to claim 2, wherein said shutter comprises a surface of said substrate table.

4. An apparatus according to claim 3, wherein said shutter has a primary surface substantially co-planar with a surface of said substrate facing said projection system and is closely adjacent to the edge of said substrate.

5. An apparatus according to claim 2, wherein said shutter is separable from the remainder of said apparatus, said apparatus further comprising an attachment device configured to releasably attach said shutter to said liquid supply system.

6. An apparatus according to claim 5, wherein said attachment device comprises a magnet.

7. An apparatus according to claim 5, wherein said attachment device comprises a vacuum outlet configured to attract said shutter to said liquid supply system.

8. An apparatus according to claim 7, wherein said liquid supply system comprises a liquid confinement structure which extends along at least part of the boundary of said space to contain said immersion liquid and which comprises a low pressure outlet configured to seal between said structure and said substrate, said low pressure outlet forming at least part of said attachment device.

9. An apparatus according to claim 2, wherein said shutter is separable from the remainder of said apparatus, wherein said shutter, said substrate table, or both, comprises a holding device configured to releasably hold said shutter to said substrate table, and wherein said holding device comprises a magnet.

10. An apparatus according to claim 2, wherein, in a stowed position, said shutter has a primary surface substantially co-planar with a surface of said substrate facing said projection system.

11. An apparatus according to claim 2, wherein said shutter comprises a guide mark.

12. An apparatus according to claim 11, comprising a sensor configured to measure a position of said shutter using said guide mark.

13. An apparatus according to claim 2, wherein said lithographic apparatus comprises a controller configured to move the substrate table towards the liquid supply system, at least a portion of the liquid supply system towards the substrate table, or both, so that the shutter confines liquid in said liquid supply system.

14. An apparatus according to claim 2, wherein said shutter comprises a shape configured to center the shutter when being attached to the liquid supply system.

15. An apparatus according to claim 2, wherein said substrate table comprises a channel to remove liquid that leaks from between said projection system and the shutter.

16. An apparatus according to claim 1, wherein the liquid supply system comprises a liquid confinement structure extending along at least a part of the boundary of said space between the projection system and the substrate table and wherein said shutter, when keeping said projection system in contact with liquid, is positioned in said structure.

17. An apparatus according to claim 1, wherein said liquid supply system comprises an outlet configured to remove liquid from said space and a gas inlet configured to provide flushing gas in said space.

18. An apparatus according to claim 1, wherein said liquid supply system comprises at least one inlet to supply said immersion liquid onto the substrate and at least one outlet to remove said immersion liquid after said liquid has passed under said projection system.

19. An apparatus according to claim 1, wherein said liquid supply system is configured to provide said liquid to a space between a final lens of said projection system and said substrate.

20. An apparatus according to claim 1, wherein said shutter is configured to keep said projection system in contact with liquid when said substrate is moved away from under said projection system.

21. A device manufacturing method comprising:

providing an immersion liquid to a space between a projection system and a substrate;

projecting a patterned beam of radiation, through said liquid, onto a target portion of the substrate using the projection system; and

maintaining said projection system in contact with liquid when said substrate, at least while on the substrate table, substantially comes out of contact with the liquid.

22. A method according to claim 21, wherein maintaining said projection system in contact with liquid comprises positioning a shutter on a side opposite said projection system such that liquid is confined between said projection system and said shutter.

23. A method according to claim 22, wherein said shutter comprises a surface of a substrate table.

24. A method according to claim 22, wherein said shutter is separable from the remainder of a lithographic apparatus, the method further comprising releasably attaching said shutter to a liquid supply system used to provide said immersion liquid to said space.

25. A method according to claim 24, wherein releasably attaching comprises attaching said shutter using at least one of magnetic force and vacuum.

26. A method according to claim 22, comprising measuring a position of said shutter using a guide mark.

27. A method according to claim 22, wherein said shutter, when keeping said projection system in contact with liquid, is positioned in a structure of a liquid supply system used to provide said immersion liquid to said space.

28. A method according to claim 22, comprising moving a substrate table towards a liquid supply system used to provide said liquid, moving at least a portion of said liquid supply system towards said substrate table, or both, so that the shutter confines liquid in said liquid supply system.

29. A method according to claim 22, comprising removing liquid that leaks from between said projection system and the shutter.

30. A method according to claim 21, comprising removing liquid from said space and flushing said space with a gas.

31. A method according to claim 21, wherein providing said immersion liquid comprises supplying said immersion liquid onto the substrate through at least one inlet and removing said immersion liquid, after said liquid has passed under said projection system, through at least one outlet.

32. A method according to claim 21, comprising providing said liquid to a space between a final lens of said projection system and said substrate.

33. A method according to claim 21, wherein said maintaining comprises maintaining said projection system in contact with liquid after said substrate has been moved away from under said projection system.