Plate Member, Substrate Holding Device, Exposure Apparatus and Method, and Device Manufacturing Method

• US 20080049209A1
• Filed: 03/20/2006
• Published: 02/28/2008
• Est. Priority Date: 03/18/2005
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Fujiwara, Tomoharu, Nagasaka, Hiroyuki
• Granted Patent: US 7,705,968 B2
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03F 7/11 having cover layers or intermediate layers, e.g. subbing layers G03F7/091 - G03F7/093, B41N3/03 take precedence
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: H01L 21/68714 the wafers being placed on a susceptor, stage or support
• CPC Class Codes: H01L 21/68735 characterised by edge profile or support profile
• CPC Class Codes: H01L 21/6875 characterised by a plurality of individual support members, e.g. support posts or protrusions
• CPC Class Codes: H01L 21/68757 characterised by a coating or a hardness or a material

Abstract

A substrate holder PH includes a first holder PH1 which holds a substrate P, a liquid-repellent inner surface Tc of a plate member T which faces a side surface Pc of the substrate P held on the first holder PH1 via a predetermined gap A, and a chamfered portion C provided on an upper portion of the inner surface Tc. On the side surface Pc of the substrate P, a liquid-repellent area is provided, and the chamfered portion C is provided so as to face the liquid-repellent area of the substrate P held on the first holder PH1. Thereby, a substrate holding device which can restrain inflow of the liquid into the back surface side of the substrate is provided.

Claims

1. A substrate holding device which holds a substrate to be exposed through a liquid, comprising:

a holder which holds the substrate;

a predetermined surface which faces a side surface of the substrate held on the holder via a predetermined gap and is liquid-repellent; and

a chamfered portion formed on an upper portion of the predetermined surface, wherein;

the side surface of the substrate is provided with a liquid-repellent area which is liquid-repellent, and

the chamfered portion is provided to face the liquid-repellent area of the substrate held on the holder.

2. The substrate holding device according to claim 1, wherein a depth of the chamfered portion is set according to the liquid-repellent area of the substrate.

3. The substrate holding device according to claim 1, wherein a lower end of the chamfered portion is set at a position higher than a lower end of the liquid-repellent area of the substrate.

4. The substrate holding device according to claim 1, further comprising a liquid-repellent upper surface extending from the chamfered portion on the upper portion of the predetermined surface so as to be substantially flush with a surface of the substrate held on the holder.

5. The substrate holding device according to claim 4, wherein a thickness of the substrate is approximately 0.775 mm, and a depth of the chamfered portion is not more than 0.5 mm.

6. The substrate holding device according to claim 1, wherein a sum of a contact angle of the liquid-repellent area of the substrate with the liquid and a contact angle of the predetermined surface with the liquid is greater than 180 degrees.

7. The substrate holding device according to claim 1, wherein the liquid-repellent area is an area in which a liquid-repellent material is coated on a base material of the substrate.

8. The substrate holding device according to claim 1, wherein the predetermined gap is 0.1 to 0.5 mm.

9. The substrate holding device according to claim 1, wherein the predetermined surface is provided to surround the side surface of the substrate.

10. The substrate holding device according to claim 1, wherein no liquid-repellent area is formed on a back surface of the substrate.

11. The substrate holding device according to claim 1, wherein the chamfered portion is coated with a liquid-repellent material.

12. The substrate holding device according to claim 1, wherein sectional shapes of an upper side portion and a lower side portion of the substrate are arced.

13. The substrate holding device according to claim 1, wherein a chamfering angle of the chamfered portion is approximately 45 degrees.

14. An exposure apparatus comprising the substrate holding device as defined in claim 1, and exposing a substrate held on the substrate holding device through a liquid.

15. A device manufacturing method comprising:

exposing a substrate by the exposure apparatus as defined in claim 14;

developing the exposed substrate; and

processing the developed substrate.

16. An exposure method for exposing a substrate through a liquid, comprising:

making a side surface of the substrate face a predetermined surface having liquid-repellency via a predetermined gap; and

exposing the substrate through the liquid,

wherein a chamfered portion is formed on an upper portion of the predetermined surface, and a liquid-repellent area is provided on the side surface of the substrate so as to face the chamfered portion.

17. The exposure method according to claim 16, wherein the liquid-repellent area of the substrate is set according to a depth of the chamfered portion.

18. The exposure method according to claim 16, wherein the liquid-repellent area is set so that a lower end position of the liquid-repellent area of the substrate becomes lower than a lower end position of the chamfered portion.

19. The exposure method according to claim 18, wherein a distance between the lower surface position of the substrate and the lower end position of the liquid-repellent area is not less than 0.2 mm.

20. The exposure method according to claim 16, wherein a sectional shape of a first area including an upper portion of the side surface of the substrate is curved, a sectional shape of a second area under the first area is a plane, and the liquid-repellent area includes the first area and at least a part of the second area.

21. The exposure method according to claim 16, wherein the liquid-repellent area is an area coated with a liquid-repellent material on a base material of the substrate.

22. A device manufacturing method comprising:

exposing a substrate by the exposure method as defined in claim 16, developing the exposed substrate, and processing the developed substrate.

23. A plate member used in an exposure apparatus which exposes a substrate held on a substrate holding device by irradiating a surface of the substrate with an exposure light beam through a liquid, the plate member comprising:

a predetermined surface which faces a side surface of the substrate held on the substrate holding device via a predetermined gap and which has a liquid-repellency; and

a chamfered portion formed on an upper portion of the predetermined surface,

wherein the chamfered portion is provided to face a liquid-repellent area on the side surface of the substrate held on the substrate holding device.

24. The plate member according to claim 23, wherein the plate member is held by sucking by the substrate holding device and is releasable.

25. The plate member according to claim 23, wherein a depth of the chamfered portion is set according to the liquid-repellent area of the substrate.

26. The plate member according to claim 25, wherein the depth of the chamfered portion is set according to a contact angle of the liquid-repellent area with the liquid.

27. The plate member according to claim 23, wherein a lower end of the chamfered portion is set at a position higher than a lower end of the liquid-repellent area of the substrate.

28. The plate member according to claim 23, further comprising a liquid-repellent upper surface extending from the chamfered portion on the upper portion of the predetermined surface so as to be substantially flush with a surface of the substrate held on the holder.

29. The plate member according to claim 23, wherein a sum of a contact angle of the liquid-repellent area of the substrate with the liquid and a contact angle of the predetermined surface with the liquid is greater than 180 degrees.

30. The plate member according to claim 23, wherein the predetermined gap is 0.1 to 0.5 mm.

31. A substrate holding device which holds a substrate to be exposed through a liquid, comprising:

a holder which holds the substrate; and

a predetermined surface which faces a side surface of the substrate held on the holder via a gap, wherein

the predetermined surface includes a flat portion which is substantially parallel to the side surface of the substrate held on the holder and a chamfered portion which extends to a position above the flat portion, and

a sum of a contact angle of the side surface of the substrate with the liquid and a contact angle of the flat portion of the predetermined surface with the liquid is greater than 180 degrees.

32. The substrate holding device according to claim 31, further comprising a liquid-repellent upper surface extending from the chamfered portion so as to be substantially flush with a surface of the substrate held on the holder.

33. The substrate holding device according to claim 31, wherein the flat portion of the predetermined surface is an area coated with a predetermined material on a base material of the substrate.

34. The substrate holding device according to claim 31, wherein the predetermined surface is provided to surround the side surface of the substrate.

35. The substrate holding device according to claim 31, wherein a chamfering angle of the chamfered portion is approximately 45 degrees.

36. The substrate holding device according to claim 31, wherein a thickness of the substrate is approximately 0.775 mm, and a depth of the chamfered portion is not more than 0.5 mm.

37. An exposure apparatus comprising:

the substrate holding device as defined in claim 31, and exposing a substrate held on the substrate holding device through a liquid.

38. A device manufacturing method comprising:

exposing a substrate by the exposure apparatus as defined in claim 37;

developing the exposed substrate; and

processing the developed substrate.

39. A plate member used in an exposure apparatus which exposes a substrate held on a substrate holding device by irradiating an exposure light beam onto a surface of the substrate through a liquid, wherein:

the plate member has a predetermined surface which faces a side surface of the substrate held on the substrate holding device via a predetermined gap;

the predetermined surface includes a flat portion which is substantially parallel to the side surface of the substrate held on the holder and a chamfered portion which extends to a position above the flat portion; and

a sum of a contact angle of the side surface of the substrate with the liquid and a contact angle of the flat portion of the predetermined surface with the liquid is greater than 180 degrees.