Method For Manufacturing Electroconductive Material-Filled Throughhole Substrate
First Claim
1. A method for manufacturing an electroconductive material-filled throughhole substrate of which the front side and back side have been electrically conducted to each other through an electroconductive material filled into the throughholes, characterized by comprising the steps of:
- forming an electroconductive base layer on one side of a core substrate having throughholes; and
filling the throughholes with an electroconductive material by electroplating using the electroconductive base layer as a seed layer.
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Abstract
Disclosed is a method for manufacturing an electroconductive material-filled throughhole substrate that is free from any void part in the electroconductive material filled into the throughholes. The method comprises forming an electroconductive base layer on one side of a core substrate having throughholes, and precipitating and growing an electroconductive material from one direction within the throughholes by electroplating using the electroconductive base layer as a seed layer to fill the electroconductive material into the throughholes without forming any void part and thus to manufacture an electroconductive material-filled throughhole substrate.
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Citations
7 Claims
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1. A method for manufacturing an electroconductive material-filled throughhole substrate of which the front side and back side have been electrically conducted to each other through an electroconductive material filled into the throughholes, characterized by comprising the steps of:
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forming an electroconductive base layer on one side of a core substrate having throughholes; and
filling the throughholes with an electroconductive material by electroplating using the electroconductive base layer as a seed layer. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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Specification