Forming method of liquid crystal layer using ink jet system
First Claim
1. A fabricating method of an array substrate of a liquid crystal display device, comprising:
- forming a gate line disposed along a first direction and a common line parallel to the gate line on a substrate, the gate and common lines spaced apart from each other;
forming a gate insulating layer on the gate and common lines;
forming a semiconductor layer on the gate insulating layer;
forming a source electrode and a pixel electrode of transparent conductive material, the pixel electrode including a drain electrode portion, the drain electrode portion overlapping the semiconductor layer, the source electrode spaced apart from the drain electrode portion;
forming a passivation layer including a first contact hole and an open portion, the first contact hole exposing the source electrode and the open portion exposing the pixel electrode, respectively; and
forming a data line disposed along a second direction on the passivation layer, the data line connected to the source electrode through the first contact hole and crossing the gate line.
1 Assignment
0 Petitions
Accused Products
Abstract
According to an embodiment, a fabrication method includes forming a gate line disposed along a first direction and a common line parallel to the gate line on a substrate, the gate and common lines spaced apart from each other, forming a gate insulating layer on the gate and common lines, forming a semiconductor layer on the gate insulating layer, forming a source electrode and a pixel electrode of transparent conductive material, the pixel electrode including a drain electrode portion, the drain electrode portion overlapping the semiconductor layer, forming a passivation layer including a first contact hole and an open portion, the first contact hole exposing the source electrode and the open portion exposing the pixel electrode, respectively, and forming a data line disposed along a second direction on the passivation layer, the data line connected to the source electrode through the first contact hole and crossing the gate line.
15 Citations
11 Claims
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1. A fabricating method of an array substrate of a liquid crystal display device, comprising:
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forming a gate line disposed along a first direction and a common line parallel to the gate line on a substrate, the gate and common lines spaced apart from each other; forming a gate insulating layer on the gate and common lines; forming a semiconductor layer on the gate insulating layer; forming a source electrode and a pixel electrode of transparent conductive material, the pixel electrode including a drain electrode portion, the drain electrode portion overlapping the semiconductor layer, the source electrode spaced apart from the drain electrode portion; forming a passivation layer including a first contact hole and an open portion, the first contact hole exposing the source electrode and the open portion exposing the pixel electrode, respectively; and forming a data line disposed along a second direction on the passivation layer, the data line connected to the source electrode through the first contact hole and crossing the gate line. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A fabricating method of an array substrate of a liquid crystal display device, comprising:
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forming a common electrode on a substrate, forming a gate line disposed along a first direction and a common line parallel to the gate line, the common line spaced apart from the gate line and contacting the common electrode; forming a gate insulating layer on the gate and common lines; forming a semiconductor layer on the gate insulating layer; forming a source electrode and a pixel electrode of transparent conductive material, the pixel electrode including a drain electrode portion, the drain electrode portion overlapping the semiconductor layer, the source electrode spaced apart from the drain electrode portion; forming a passivation layer including a first contact hole and an open portion, the first contact hole exposing the source electrode and the open portion exposing the pixel electrode, respectively; and forming a data line disposed along a second direction on the passivation layer, the data line connected to the source electrode through the first contact hole and crossing the gate line.
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Specification