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Coating method utilizing phosphor containment structure and devices fabricated using same

  • US 20090014736A1
  • Filed: 07/11/2007
  • Published: 01/15/2009
  • Est. Priority Date: 07/11/2007
  • Status: Active Grant
First Claim
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1. A method for fabricating a semiconductor devices, comprising:

  • providing a plurality of semiconductor devices on a substrate;

    forming a contact on at least some of said semiconductor devices;

    forming a containment structure on at least some of said semiconductor devices having said contact, each said containment structure defining a deposition area excluding its said contact; and

    depositing a coating material within said deposition area, said coating material not covering said contact.

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