SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR

  • US 20090230404A1
  • Filed: 10/26/2006
  • Published: 09/17/2009
  • Est. Priority Date: 04/28/2006
  • Status: Active Grant
First Claim
Patent Images

1. A semiconductor device comprisinga semiconductor film made of silicon carbide,wherein the semiconductor film has a facet on its surface, andwherein the facet is used as a channel.

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