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NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS

  • US 20090274978A1
  • Filed: 04/30/2009
  • Published: 11/05/2009
  • Est. Priority Date: 05/01/2008
  • Status: Active Grant
First Claim
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1. A photoacid generator for chemically amplified resist compositions which generates a sulfonic acid in response to high-energy radiation selected from UV, deep-UV, EUV, electron beam, x-ray, excimer laser, gamma-ray and synchrotron radiation, said sulfonic acid having the general formula (1a) or (1b):


  • R1

    COOCH2CF2SO3

    H+



    (1a)
    R1

    O—

    COOCH2CF2SO3

    H+



    (1b)wherein R1 is a monovalent C20-C50 hydrocarbon group of steroid structure which may contain a heteroatom.

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