PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE

  • US 20100080963A1
  • Filed: 03/25/2009
  • Published: 04/01/2010
  • Est. Priority Date: 09/28/2007
  • Status: Active Grant
First Claim
Patent Images

1. A polymer compound obtained by reacting a monomer represented by the following Formula (1) and a monomer represented by the following Formula (2):

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