Method for Fabricating a Heater Capable of Adjusting Refractive Index of an Optical Waveguide

• US 20100092682A1
• Filed: 08/29/2008
• Published: 04/15/2010
• Est. Priority Date: 10/24/2007
• Status: Abandoned Application

• Current Assignee: BAE Systems Information and Electronic Systems Integration Incorporated (BAE Systems Plc)
• Original Assignee: BAE Systems Information and Electronic Systems Integration Incorporated (BAE Systems Plc)
• Inventors: Carothers, Daniel N., Hill, Craig M., Pomerene, Andrew T.S., Conway, Timothy J., Ishii, Jonathan N., McIntyre, Thomas J.
• Application Number:
  US12/521,855
• Publication Number:
  US 20100092682A1
• Time in Patent Office: Days
• US Class Current: 427/383.3
• CPC Class Codes: G02B 6/10 of the optical waveguide type G02B6/02, G02B6/24 take precedence; devices or arrangements for the control of light by electric, magnetic, electro-magnetic or acoustic means G02F1/00; transferring the modulation of modulated light G02F2/00; optical logic elements G02F3/00; optical analogue/digital converters G02F7/00
• CPC Class Codes: G02B 6/12033 characterised by means for configuring the device, e.g. moveable element for wavelength tuning switching G02B6/35; thermo-optic devices G02F1/0147
• CPC Class Codes: G02F 1/011 in optical waveguides, not otherwise provided for in this subclass
• CPC Class Codes: G02F 1/0147 based on thermo-optic effects G02F1/132 takes precedence

Abstract

A method for fabricating a thermal optical heating element capable of adjusting refractive index of an optical waveguide is disclosed. A silicon block is initially formed on a cladding layer on a silicon substrate. The silicon block is located in close proximity to an optical waveguide. A cobalt layer is deposited on the silicon block. The silicon block is then annealed to cause the cobalt layer to react with the silicon block to form a cobalt silicide layer. The silicon block is again annealed to cause the cobalt silicide layer to transform into a cobalt di-silicide layer.

Claims

1. A method for manufacturing a heater for adjusting index of refraction of an optical waveguide, said method comprising:

forming a silicon block on a cladding layer on a substrate, wherein said silicon block is located in close proximity to an optical waveguide;

depositing a metal layer on said silicon block; and

annealing said silicon block to cause said metal layer to react with said silicon block to form a silicide layer.

2. The method of claim 1, wherein said method further includes annealing said silicon block to cause said cobalt layer to transform into a cobalt di-silicide layer.

3. The method of claim 1, wherein said silicon block is made of amorphorus silicon.

4. The method of claim 1, wherein said silicon block is made of polycrystaline silicon.

5. The method of claim 1, wherein said silicon block is approximately 2,000 Å

thick.

6. The method of claim 1, wherein said cladding layer is made of silicon dixode.

7. The method of claim 1, wherein said metal layer is made of cobalt.

8. The method of claim 1, wherein said metal layer is made of nickel.

9. The method of claim 1, wherein said metal layer is made of titanium.

10. The method of claim 1, wherein said metal layer is approximately 150 Å

thick.