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SELENIUM CONTAINING ELECTRODEPOSITION SOLUTION AND METHODS

  • US 20100140098A1
  • Filed: 12/18/2009
  • Published: 06/10/2010
  • Est. Priority Date: 05/15/2008
  • Status: Abandoned Application
First Claim
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1. An electrodeposition solution to electrodeposit a Group IB-Group VIA thin film, comprising:

  • a solvent;

    a Group IB material source that dissolves in the solvent and provides a Group IB material;

    a Group VIA material source that dissolves in the solvent and provides a Group VIA material; and

    at least one complexing that forms a complex ion of the Group IB material wherein such complex ion dissolves in the solvent;

    an adhesion promoting agent;

    a corrosion inhibitor; and

    wherein the pH of the electrodeposition solution is in the range of 1-13.

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