Reflective structure, display apparatus including the reflective structure, and method of manufacturing the reflective structure and display apparatus

• US 20100177393A1
• Filed: 12/30/2009
• Published: 07/15/2010
• Est. Priority Date: 01/13/2009
• Status: Abandoned Application

• Current Assignee: Korea Advanced Institute of Science and Technology, Samsung Electronics Co. Ltd.
• Original Assignee: Korea Advanced Institute of Science and Technology, Samsung Electronics Co. Ltd.
• Inventors: Lee, Yong-hee, Kang, Sung-yong, Lee, Hong-Seok, Chae, Seong-hwan, Shin, Jung-hoon
• Application Number:
  US12/654,713
• Publication Number:
  US 20100177393A1
• Time in Patent Office: Days
• US Class Current: 359/584
• CPC Class Codes: B29D 11/00596 Mirrors
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: G02B 2207/101 Nanooptics
• CPC Class Codes: G02B 5/0808 having a single reflecting layer G02B5/0883, G02B5/0891 take precedence

Abstract

Example embodiments relate to a reflective structure, a display apparatus including the reflective structure, and a method of manufacturing the reflective structure and the display apparatus. A reflective structure according to example embodiments may include a plurality of nanoparticles of non-uniform size, which are arranged on a substrate, or an uneven element having a surface contour that resembles a plurality of nanoparticles; and a reflective layer covering the plurality of nanoparticles or the uneven element. The reflective layer may have a random/variable height.

Claims

1. A reflective structure comprising:

an understructure having a first uneven surface, the understructure being a plurality of nanoparticles of non-uniform size on a substrate or being a sublayer having a non-uniform surface equivalent to surfaces of the plurality of nanoparticles; and

a reflective layer on the understructure, the reflective layer having a second uneven surface.

2. The reflective structure of claim 1, wherein the reflective layer includes at least one first layer and at least one second layer, the first and second layers being alternately stacked.

3. The reflective structure of claim 2, wherein the first layer and the second layer are different dielectric layers, or

wherein one of the first layer and the second layer is a dielectric layer, and the other one of the first layer and the second layer is a non-dielectric layer.

4. The reflective structure of claim 3, wherein the non-dielectric layer is a metal layer.

7. A display apparatus comprising the reflective structure of claim 1.

8. The display apparatus of claim 7, wherein the reflective layer includes at least one first layer and at least one second layer, the first and second layers being alternately stacked.

9. The display apparatus of claim 8, wherein the first layer and the second layer are different dielectric layers, or

wherein one of the first layer and the second layer is a dielectric layer, and the other one of the first layer and the second layer is a non-dielectric layer.

10. The display apparatus of claim 9, wherein the non-dielectric layer is a metal layer.

5. A reflective structure comprising:

an understructure having a first uneven surface; and

a reflective layer on the first uneven surface of the understructure, the reflective layer having a second uneven surface, and

wherein the reflective layer includes at least one non-dielectric layer and at least one dielectric layer, the non-dielectric layer and the dielectric layer being alternately stacked.

6. The reflective structure of claim 5, wherein the non-dielectric layer is a metal layer.

11. A display apparatus comprising the reflective structure of claim 5.

12. A method of manufacturing a reflective structure, comprising:

coating a substrate with a plurality of nanoparticles of non-uniform size; and

forming a reflective layer on the plurality of nanoparticles, the reflective layer having an uneven surface that corresponds to a contour of the plurality of nanoparticles.

13. The method of claim 12, wherein the reflective layer includes at least one first layer and at least one second layer, the first and second layers being alternately stacked.

14. The method of claim 13, wherein the first layer and the second layer are different dielectric layers, or

wherein one of the first layer and the second layer is a dielectric layer, and the other one of the first layer and the second layer is a non-dielectric layer.

15. The method of claim 14, wherein the non-dielectric layer is a metal layer.

16. A method of manufacturing a reflective structure, comprising:

coating a supporting material with a plurality of nanoparticles of non-uniform size;

forming a mold layer covering the plurality of nanoparticles;

separating the mold layer from the supporting material to attain a master stamp having an under surface that corresponds to a contour of the plurality of nanoparticles;

forming a first uneven surface on a substrate by imprinting the substrate with the master stamp; and

forming a reflective layer covering the first uneven surface, the reflective layer having a second uneven surface that corresponds to a contour of the first uneven surface.

17. The method of claim 16, wherein the reflective layer includes at least one first layer and at least one second layer, the first and second layers being alternately stacked.

18. The method of claim 17, wherein the first layer and the second layer are different dielectric layers, or

wherein one of the first layer and the second layer is a dielectric layer, and the other one of the first layer and the second layer is a non-dielectric layer.

19. The method of claim 18, wherein the non-dielectric layer is a metal layer.

20. A method of manufacturing a reflective structure, comprising:

coating a substrate with a plurality of first nanoparticles;

etching the plurality of first nanoparticles and exposed portions of the substrate between the plurality of first nanoparticles to form an etched substrate having a first uneven surface; and

forming a reflective layer on the etched substrate, the reflective layer having a second uneven surface that corresponds to a contour of the first uneven surface.

21. The method of claim 20, wherein the plurality of first nanoparticles are of non-uniform size.

22. The method of claim 20, wherein the plurality of first nanoparticles are of uniform size.

23. The method of claim 20, wherein forming the etched substrate having the first uneven surface includes:

initially etching the plurality of first nanoparticles to expose portions of the substrate between the plurality of first nanoparticles; and

etching the exposed portions of the substrate.

24. The method of claim 20, wherein forming the etched substrate having the first uneven surface includes simultaneously etching the plurality of first nanoparticles and the exposed portions of the substrate between the plurality of first nanoparticles.

25. The method of claim 20, further comprising:

removing the plurality of first nanoparticles after forming the etched substrate having the first uneven surface.

26. The method of claim 25, further comprising:

coating the substrate with a plurality of second nanoparticles after removing the plurality of first nanoparticles; and

etching the plurality of second nanoparticles and exposed portions of the substrate between the plurality of second nanoparticles.

27. The method of claim 20, wherein the reflective layer includes at least one first layer and at least one second layer, the first and second layers being alternately stacked.

28. The method of claim 27, wherein the first layer and the second layer are different dielectric layers, or

wherein one of the first layer and the second layer is a dielectric layer, and the other one of the first layer and the second layer is a non-dielectric layer.

29. The method of claim 28, wherein the non-dielectric layer is a metal layer.