Multilayer Photonic Structures
First Claim
1. A multilayer photonic structure comprising a plurality of coating layers of high index dielectric material having an index of refraction nH and a plurality of coating layers of low index dielectric material having an index of refraction nL, wherein:
- the plurality of coating layers of high index dielectric material and the plurality of coating layers of low index dielectric material are alternately arranged and a first coating layer and a last coating layer of the multilayer photonic structure comprise low index material;
an index-thickness of each coating layer of low index dielectric material is different than an index-thickness of other coating layers of low index dielectric material;
an index-thickness of each coating layer of high index dielectric material is different than an index-thickness of other coating layers of high index dielectric material;
the index-thicknesses of the plurality of coating layers of low index dielectric material are different than the index-thicknesses of the plurality of coating layers of high index dielectric material; and
the multilayer photonic structure has a first high reflectivity bandwidth, a second high reflectivity bandwidth and a low reflectivity bandwidth for electromagnetic radiation incident on a surface of the multilayer photonic structure from 0 degrees to 45 degrees, wherein the low reflectivity bandwidth is positioned between the first high reflectivity bandwidth and the second high reflectivity bandwidth.
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Abstract
A multilayer photonic structure may include a plurality of coating layers of high index dielectric material of index of refraction nH and a plurality of coating layers of low index dielectric material of index of refraction nL alternately arranged with a first coating layer and a last coating layer of the multi-layer photonic structure comprise low index material. An index-thickness of each coating layer of the multilayer photonic structure is different than every other coating layer of the multilayer photonic structure. The multilayer photonic structure has a first high reflectivity bandwidth, a second high reflectivity bandwidth and a low reflectivity bandwidth wherein the low reflectivity bandwidth is positioned between the first high reflectivity bandwidth and the second high reflectivity bandwidth.
124 Citations
20 Claims
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1. A multilayer photonic structure comprising a plurality of coating layers of high index dielectric material having an index of refraction nH and a plurality of coating layers of low index dielectric material having an index of refraction nL, wherein:
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the plurality of coating layers of high index dielectric material and the plurality of coating layers of low index dielectric material are alternately arranged and a first coating layer and a last coating layer of the multilayer photonic structure comprise low index material; an index-thickness of each coating layer of low index dielectric material is different than an index-thickness of other coating layers of low index dielectric material; an index-thickness of each coating layer of high index dielectric material is different than an index-thickness of other coating layers of high index dielectric material; the index-thicknesses of the plurality of coating layers of low index dielectric material are different than the index-thicknesses of the plurality of coating layers of high index dielectric material; and the multilayer photonic structure has a first high reflectivity bandwidth, a second high reflectivity bandwidth and a low reflectivity bandwidth for electromagnetic radiation incident on a surface of the multilayer photonic structure from 0 degrees to 45 degrees, wherein the low reflectivity bandwidth is positioned between the first high reflectivity bandwidth and the second high reflectivity bandwidth. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A UV-IR reflector comprising a plurality of coating layers of high index dielectric material having an index of refraction nH and a plurality of coating layers of low index dielectric material having an index of refraction nL, wherein:
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the plurality of coating layers of high index dielectric material and the plurality of coating layers of low index dielectric material are alternately arranged and a first coating layer and a last coating layer of the UV-IR reflector comprise low index material; an index-thickness of each coating layer of low index dielectric material is different than an index-thickness of other coating layers of low index dielectric material; an index-thickness of each coating layer of high index dielectric material is different than an index-thickness of other coating layers of high index dielectric material; the index-thicknesses of the plurality of coating layers of low index dielectric material are different than the index-thicknesses of the plurality of coating layers of high index dielectric material; and the UV-IR reflector has a first high reflectivity bandwidth with a reflectance of 50% or greater for wavelengths of electromagnetic radiation in an ultraviolet portion of the electromagnetic spectrum and a second high reflectivity bandwidth with a reflectance of 80% or greater for wavelengths of light in an infrared portion of the electromagnetic spectrum. - View Dependent Claims (12, 13, 14, 15, 16)
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17. An article of manufacture comprising a multilayer photonic structure, the multilayer photonic structure comprising a plurality of coating layers of high index dielectric material having an index of refraction nH and a plurality of coating layers of low index dielectric material having an index of refraction nL, wherein:
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the plurality of coating layers of high index dielectric material and the plurality of coating layers of low index dielectric material are alternately arranged and a first coating layer and a last coating layer of the multilayer photonic structure comprise low index material; an index-thickness of each coating layer of low index dielectric material is different than an index-thickness of other coating layers of low index dielectric material; an index-thickness of each coating layer of high index dielectric material is different than an index-thickness of other coating layers of high index dielectric material; the index-thicknesses of the plurality of coating layers of low index dielectric material are different than the index-thicknesses of the plurality of coating layers of high index dielectric material; and the multilayer photonic structure has a first high reflectivity bandwidth, a second high reflectivity bandwidth and a low reflectivity bandwidth for electromagnetic radiation incident on a surface of the multilayer photonic structure from 0 degrees to 45 degrees, wherein the low reflectivity bandwidth is positioned between the first high reflectivity bandwidth and the second high reflectivity bandwidth. - View Dependent Claims (18, 19, 20)
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Specification