LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• US 20100265476A1
• Filed: 04/23/2010
• Published: 10/21/2010
• Est. Priority Date: 08/29/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Seuntiens-Gruda, Lejla, Donders, Sjoerd Nicolaas Lambertus, Stavenga, Marco Koert, Verhagen, Martinus Cornelis Maria, Jansen, Hans, Jacobs, Johannes Henricus Wilhelmus, Streefkerk, Bob, Loopstra, Erik Roelof, Mertens, Jeroen Johannes Sophia Maria, Dierichs, Marcel Mathijs Theodore Marie
• Granted Patent: US 8,629,971 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: B01D 19/0031 by filtration
• CPC Class Codes: B01D 61/025 Reverse osmosis; Hyperfiltration
• CPC Class Codes: B01D 61/24 Dialysis ; Membrane extraction
• CPC Class Codes: C02F 1/04 by distillation or evaporation
• CPC Class Codes: C02F 1/20 by degassing, i.e. liberation of dissolved gases degasification of liquids in general B01D19/00; arrangement of degassing apparatus in boiler feed supply F22D
• CPC Class Codes: C02F 1/28 by sorption using ion-exchange C02F1/42; sorbent compositions B01J
• CPC Class Codes: C02F 1/283 using coal, charred products, or inorganic mixtures containing them
• CPC Class Codes: C02F 1/32 with ultraviolet light
• CPC Class Codes: C02F 1/42 by ion-exchange ion-exchange in general B01J
• CPC Class Codes: C02F 1/441 by reverse osmosis
• CPC Class Codes: C02F 2103/40 from the manufacture or use of photosensitive materials
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

Claims

1-36. -36. (canceled)

37. A lithographic projection apparatus comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate; and

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with an immersion liquid, the liquid supply system comprising a liquid purifier configured to purify the immersion liquid, the liquid purifier comprising a degasser to degas the immersion liquid before introduction into the space, the degasser being upstream from and not in contact with the space.

38. The apparatus of claim 37, wherein the degasser comprises a membrane to contact the immersion liquid to separate gas and liquid of the immersion liquid.

39. The apparatus of claim 37, further comprising a measurement device configured to measure oxygen content of the degassed liquid.

40. A lithographic projection apparatus comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate; and

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system constructed and arranged to irradiate the liquid with ultraviolet radiation prior to entry of the irradiated liquid into the space.

41. The apparatus of claim 40, wherein the ultra-violet radiation is selected to kill lifeforms in the liquid.

42. A lithographic projection apparatus comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate; and

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system configured to add to the liquid, a lifeform-growth inhibiting chemical.

43. The apparatus of claim 42, wherein the chemical is selected from the group consisting of halogen containing compounds, alcohols, aldehydes, ozone and heavy metals.

44. A lithographic projection apparatus, comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising;

a liquid purifier configured to purify the liquid; and

a gas reduction device configured to reduce the oxygen content of the liquid.

45. The apparatus of claim 44, wherein the liquid purifier is configured to purify the liquid such that it has a particle content of no more than 2 particles having a dimension of 50 nm or greater per ml of liquid.

46. The apparatus of claim 44, wherein the liquid purifier is configured to purify the liquid such that it has a particle content of no more than 0.5 particles having a dimension of 50 nm or greater per ml of liquid.

47. The apparatus of claim 44, further comprising a measurement device configured to measure the presence of particles in the liquid, the measurement device located downstream in a flow path of the liquid from the gas reduction device.

48. The apparatus of claim 47, wherein the measurement device comprises a particle counter.

49. The apparatus of claim 44, wherein the gas reduction device comprises a membrane configured to be in contact with the liquid to separate gas from the liquid, the membrane not in contact with the space.

50. The apparatus of claim 44, wherein the liquid purifier comprises a distillation unit, or a de-hydrocarbonating unit configured to reduce the hydrocarbon content of the liquid, or a demineralizer, or any combination of the foregoing.

51. The apparatus of claim 44, constructed and arranged to irradiate the liquid with ultraviolet radiation prior to entry of the irradiated liquid into the space.

52. The apparatus of claim 44, configured to apply a life-form killing substance or radiation to the liquid and further comprising a filter configured to remove killed life-forms from the liquid.

53. The apparatus of claim 44, further comprising a measurement device configured to measure the oxygen content of the liquid.

54. A lithographic projection apparatus comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate; and

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid; and

a particle counter configured to count particles in the liquid.

55. The apparatus of claim 54, further comprising a liquid purifier configured to purify the liquid such that it has a particle content of no more than 2 particles having a dimension of 50 nm or greater per ml of liquid.

56. The apparatus of claim 54, further comprising a liquid purifier configured to purify the liquid such that it has a particle content of no more than 0.5 particles having a dimension of 50 nm or greater per ml of liquid.