APPARATUS FOR RESTRICTING MOISTURE INGRESS
First Claim
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1. An electrical circuit apparatus comprising a moisture ingress barrier, wherein the apparatus comprises:
- a first portion comprising;
at least one side surface,a substantially planar connection surface,a substrate provided from a wafer, andone or more layers formed on the substrate terminating at the connection surface, wherein at least a portion of the at least one side surface is defined by the one or more layers, wherein the one or more layers comprise;
at least one circuit device comprising electrical circuitry, wherein a perimeter region is defined between the at least one circuit device and the at least one side surface, anda metallic structure laterally surrounding the at least one circuit device and forming at least part of the moisture ingress barrier, wherein the metallic structure extends from the substrate to the connection surface and is located within the perimeter region; and
a second portion comprising;
at least one side surface,a substantially planar connection surface, anda substrate provided from a wafer, wherein at least a portion of the at least one surface is defined by the substrate,wherein the connection surface of the first portion is bonded to the connection surface of the second portion to form a hermetic interface proximate the metallic structure of the first portion, wherein the hermetic interface forms at least a part of the moisture ingress bather.
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Accused Products
Abstract
Apparatus and methods to protect circuitry from moisture ingress, e.g., using a metallic structure as part of a moisture ingress barrier.
68 Citations
19 Claims
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1. An electrical circuit apparatus comprising a moisture ingress barrier, wherein the apparatus comprises:
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a first portion comprising; at least one side surface, a substantially planar connection surface, a substrate provided from a wafer, and one or more layers formed on the substrate terminating at the connection surface, wherein at least a portion of the at least one side surface is defined by the one or more layers, wherein the one or more layers comprise; at least one circuit device comprising electrical circuitry, wherein a perimeter region is defined between the at least one circuit device and the at least one side surface, and a metallic structure laterally surrounding the at least one circuit device and forming at least part of the moisture ingress barrier, wherein the metallic structure extends from the substrate to the connection surface and is located within the perimeter region; and a second portion comprising; at least one side surface, a substantially planar connection surface, and a substrate provided from a wafer, wherein at least a portion of the at least one surface is defined by the substrate, wherein the connection surface of the first portion is bonded to the connection surface of the second portion to form a hermetic interface proximate the metallic structure of the first portion, wherein the hermetic interface forms at least a part of the moisture ingress bather. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. An electrical circuit apparatus comprising a moisture ingress barrier, wherein the apparatus comprises:
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a first portion comprising; at least one side surface, a substantially planar connection surface, a substrate provided from a wafer, and one or more layers formed on the substrate terminating at the connection surface, wherein at least a portion of the at least one side surface is formed by the one or more layers, wherein the one or more layers comprise; at least one circuit device comprising electrical circuitry, wherein a perimeter region is defined between the at least one circuit device and the at least one side surface, and a metallic structure laterally surrounding the at least one circuit device and forming at least part of the moisture ingress barrier, wherein the metallic structure extends from the substrate to the connection surface and is located within the perimeter region; and a second portion comprising; at least one side surface, a substantially planar connection surface, a substrate provided from a wafer, and one or more layers formed on the substrate terminating at the connection surface, wherein at least a portion of the at least one side surface is defined by the one or more layers, wherein the one or more layers comprise; at least one circuit device comprising electrical circuitry, wherein a perimeter region is defined between the at least one circuit device and the at least one side surface, and a metallic structure laterally surrounding the at least one circuit device and forming at least part of the moisture ingress barrier, wherein the metallic structure extends from the substrate to the connection surface and is located within the perimeter region, wherein the connection surface of the first portion is bonded to the connection surface of the second portion to form a hermetic interface proximate the metallic structures of the first and the second portions, wherein the hermetic interface forms at least part of the moisture ingress barrier. - View Dependent Claims (9, 10, 11, 12, 13)
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14. A method of providing at least one electrical circuit apparatus comprising a moisture ingress barrier, wherein the method comprises:
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providing a first portion, wherein the first portion comprises a substantially planar connection surface, wherein providing the first portion comprises; providing a wafer substrate, and providing one or more layers formed on the substrate terminating at the connection surface, wherein the one or more layers comprise; at least one circuit device comprising electrical circuitry, wherein a perimeter region is defined laterally surrounding the at least one circuit device, and at least one metallic structure laterally surrounding the at least one circuit device and forming at least part of the moisture ingress barrier of the at least one electrical circuit apparatus, wherein the at least one metallic structure extends from the substrate to the connection surface and is located within the perimeter region; and providing a second portion, wherein the second portion comprises a substantially planar connection surface, wherein providing the second portion comprises providing a wafer substrate; and coupling the connection surface of the first portion to the connection surface of the second portion to form at least one hermetic interface proximate the at least one metallic structure of the first portion, wherein the at least one hermetic interface forms at least part of the moisture ingress barrier of the at least one electrical circuit apparatus. - View Dependent Claims (15, 16, 17, 18, 19)
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Specification