LOW-MAINTENANCE COATINGS, AND METHODS FOR PRODUCING LOW-MAINTENANCE COATINGS
First Claim
1. A method of depositing of a low-maintenance coating on a major surface of a substrate, the low-maintenance coating including a base film and a functional film, the base film being deposited by a high-rate sputtering technique wherein at least one target is sputtered in an atmosphere into which both inert gas and reactive gas are flowed, wherein an inflow rate for the inert gas divided by an inflow rate for the reactive gas is between 0.4 and 9, the functional film being deposited by a high-rate sputtering technique that uses at least one target having a sputterable material comprising both titanium oxide and tungsten oxide.
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Accused Products
Abstract
The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes both titanium oxide and tungsten oxide. The invention also provides methods and equipment for depositing such coatings.
107 Citations
5 Claims
- 1. A method of depositing of a low-maintenance coating on a major surface of a substrate, the low-maintenance coating including a base film and a functional film, the base film being deposited by a high-rate sputtering technique wherein at least one target is sputtered in an atmosphere into which both inert gas and reactive gas are flowed, wherein an inflow rate for the inert gas divided by an inflow rate for the reactive gas is between 0.4 and 9, the functional film being deposited by a high-rate sputtering technique that uses at least one target having a sputterable material comprising both titanium oxide and tungsten oxide.
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5-12. -12. (canceled)
Specification