• US 20100326819A1
  • Filed: 06/24/2009
  • Published: 12/30/2010
  • Est. Priority Date: 06/24/2009
  • Status: Abandoned Application
First Claim
Patent Images

1. A method for making a patterned perpendicular magnetic recording disk comprising:

  • providing a rigid substrate;

    depositing a perpendicular magnetic recording layer on the substrate, a hard mask layer on the recording layer, an etch stop layer on the hard mask layer, and a polymeric resist layer on the etch stop layer;

    patterning the resist layer by imprint lithography to have a plurality of recesses with spaces between the recesses, the patterned resist layer having regions of residual polymeric material between the bottoms of said recesses and the etch stop layer;

    removing said regions of residual polymeric material by reactive ion etching (RIE) in an oxygen-containing plasma to expose regions of etch stop material;

    removing said regions of etch stop material by RIE in a plasma selected from a fluorine-containing plasma and a chlorine-containing plasma to expose regions of hard mask material;

    removing said exposed regions of hard mask material by one of reactive ion milling (RIM) in oxygen and reactive ion beam etching (RIBE) in oxygen to expose regions of the underlying recording layer; and

    ion milling the exposed regions of the recording layer.

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