METHOD FOR REMOVING IMPLANTED PHOTO RESIST FROM HARD DISK DRIVE SUBSTRATES

  • US 20110006034A1
  • Filed: 06/23/2010
  • Published: 01/13/2011
  • Est. Priority Date: 07/13/2009
  • Status: Active Grant
First Claim
Patent Images

1. A method of removing a resist layer from a magnetically active substrate, comprising:

  • providing a gas mixture comprising a reagent gas comprising fluorine, an oxidizing gas, and a reducing gas to a processing chamber;

    forming an inductive plasma from the gas mixture by applying energy selected from the group consisting of RF energy, pulsed DC energy, and microwave energy to the gas mixture; and

    etching the resist layer by immersing the magnetically active substrate in the plasma.

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