DETERMINING ENDPOINT IN A SUBSTRATE PROCESS

• US 20110019201A1
• Filed: 10/05/2010
• Published: 01/27/2011
• Est. Priority Date: 11/01/2002
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: LIAN, Lei, DAVIS, Matthew F.
• Granted Patent: US 7,969,581 B2
• Time in Patent Office: Days
• US Class Current: 356/503
• CPC Class Codes: G01B 11/0675 using interferometry
• CPC Class Codes: G01B 11/0683 measurement during deposition or removal of the layer
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/32963 End-point detection

Abstract

An endpoint detection method for detecting an endpoint of a process comprises reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths. A plurality of light beams having different wavelengths are generated from the reflected polychromatic light. A wavelength of light is determined from the plurality of light beams, at which a local intensity of the reflected light is maximized.

Claims

1. An endpoint detection method comprising:

(a) reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths;

(b) generating a plurality of light beams having different wavelengths from the reflected polychromatic light; and

(c) determining a wavelength of light from the plurality of light beams at which a local intensity of the reflected light is maximized during the processing of the substrate.

2. A method according to claim 1 wherein (a) comprises scanning across the substrate, light having wavelengths of from about 200 to about 800 nm.

3. A method according to claim 1 wherein (a) comprises focusing the polychromatic light on the substrate.

4. A method according to claim 1 wherein (a) comprises directing polychromatic light from a xenon or Hg—

Cd lamp.

5. A method according to claim 1 wherein (b) comprises passing the reflected polychromatic light through a prism to generate a plurality of light beams having different wavelengths.

6. A method according to claim 1 wherein (b) comprises rotating a diffraction grating to separate the light beams.

7. A method according to claim 6 comprising rotating the diffraction grating along an axis that is non-orthogonal to a surface plane of the diffraction grating.

8. A method according to claim 6 wherein (c) comprises receiving the separated light beams and generating an intensity signal trace of the intensity of each wavelength of the separated light beams.

9. A method according to claim 1 wherein (b) comprises filtering the reflected polychromatic light to generate light beams having different wavelengths.

10. A method according to claim 9 wherein (c) comprises receiving the filtered light beams and generating an intensity signal trace of the intensity of each wavelength of the reflected light beams.

11. A method according to claim 1 further comprising processing the substrate in the process zone by exposing the substrate to an energized gas in the process zone while monitoring the wavelength of substrate reflected light at which a local intensity is maximized.

12. An endpoint detection method comprising:

(a) reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths;

(b) passing the reflected polychromatic light through a prism to generate a plurality of light beams having different wavelengths; and

(c) determining a wavelength of light from the plurality of light beams at which a local intensity of the reflected light is maximized during the processing of the substrate.

13. A method according to claim 12 wherein (a) comprises scanning across the substrate, light having wavelengths of from about 200 to about 800 nm.

14. A method according to claim 12 wherein (a) comprises focusing the polychromatic light on the substrate.

15. A method according to claim 12 wherein (a) comprises directing a polychromatic spectrum of light from a polychromatic light source comprising a xenon or Hg—

Cd lamp.

16. A method according to claim 12 wherein (c) comprises receiving the plurality of light beams and generating an intensity signal trace of the intensity of each wavelength of the plurality of light beams.

17. A method according to claim 12 further comprising processing the substrate in the process zone by exposing the substrate to an energized gas in the process zone while monitoring the wavelength of substrate reflected light at which a local intensity is maximized.

18. An endpoint detection method comprising:

(a) reflecting polychromatic light from a substrate, the polychromatic light having a plurality of wavelengths;

(b) filtering the reflected polychromatic light to generate light beams having different wavelengths; and

(c) determining a wavelength of light from the plurality of light beams at which a local intensity of the reflected light is maximized during the processing of the substrate.

19. A method according to claim 18 wherein (a) comprises scanning wavelengths of from about 200 to about 800 nm.

20. A method according to claim 18 wherein (a) comprises focusing the polychromatic light on the substrate.

21. A method according to claim 18 wherein (a) comprises directing a polychromatic spectrum of light from a polychromatic light source comprising a xenon or Hg—

Cd lamp.

22. A method according to claim 18 wherein (b) comprises passing the reflected light beam through a rotating diffraction grating to separate the light beams.

23. A method according to claim 19 wherein (b) comprises rotating the diffraction grating along an axis that is non-orthogonal to a surface plane of the diffraction grating.

24. A method according to claim 18 wherein (b) comprises processing a signal of the reflected light beam through a bandpass filter to separate signals of the light beam.

25. A method according to claim 18 further comprising processing the substrate in the process zone by exposing the substrate to an energized gas in the process zone while monitoring the wavelength of substrate reflected light at which a local intensity is maximized.