SUBSTRATE PROCESSING APPARATUS, POSITIONING METHOD AND FOCUS RING INSTALLATION METHOD

  • US 20110031111A1
  • Filed: 08/05/2010
  • Published: 02/10/2011
  • Est. Priority Date: 08/07/2009
  • Status: Active Grant
First Claim
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1. A substrate processing apparatus for performing a plasma process on a substrate accommodated in a processing chamber and surrounded by a focus ring, the apparatus comprising:

  • a mounting table including a susceptor having a substrate mounting surface on which the substrate is mounted and a focus ring mounting surface on which the focus ring is mounted; and

    a plurality of positioning pins made of a material expandable in a diametric direction by heating,wherein each positioning pin is inserted into a positioning hole formed in the focus ring mounting surface of the susceptor and into a positioning hole formed in the focus ring, andeach positioning pin is expanded in the diametric direction by heating and fitted into the positioning holes, thus allowing a position of the focus ring to be aligned.

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