High voltage MOSFET diode reverse recovery by minimizing P-body charges
First Claim
1. A semiconductor power device disposed in a semiconductor substrate comprises an active cell area and a termination area comprising:
- a semiconductor substrate comprising a bottom substrate layer, and a top substrate layer situated on top of said bottom substrate layer;
a planar gate comprising a patterned polysilicon layer disposed on a top surface of said semiconductor substrate;
a patterned field oxide layer disposed in said termination area and also in said active cell area at a gap area away from said patterned polysilicon layer on said top surface of said semiconductor substrate;
body regions disposed in said semiconductor substrate substantially diffused from a region aligned with said gap area below said top surface and extended to regions below said patterned polysilicon layer and said patterned field oxide layer, said body region having an opposite conductivity type as said top substrate layer;
source regions encompassed in and having an opposite conductivity type from said body regions;
body contact regions encompassed in and having a higher dopant concentration than said body region surrounding said source regions, the body contact regions being located below said doped source regions, wherein said field oxide layer in the active cell area is removed after forming the body, source and body contact regions;
a contact trench formed next to said planar gate, wherein said contact trench is etched into the semiconductor substrate and allows contact to be made laterally to the source and body contact regions, said contact trenches being formed partially in an area previously occupied by said field oxide layer in said active cell area; and
a bottom electrode formed at the bottom of the semiconductor substrate.
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Accused Products
Abstract
This invention discloses a method for manufacturing a semiconductor power device in a semiconductor substrate comprises an active cell area and a termination area. The method comprises the steps of a) growing and patterning a field oxide layer in the termination area and also in the active cell area on a top surface of the semiconductor substrate b) depositing and patterning a polysilicon layer on the top surface of the semiconductor substrate at a gap distance away from the field oxide layer; c) performing a blank body dopant implant to form body dopant regions in the semiconductor substrate substantially aligned with the gap area followed by diffusing the body dopant regions into body regions in the semiconductor substrate; d) implanting high concentration body-dopant regions encompassed in and having a higher dopant concentration than the body regions e) applying a source mask to implant source regions having a conductivity opposite to the body region with the source regions encompassed in the body regions and surrounded by the high concentration body-dopant regions; and f) etching contact trenches into the source, body contact, and body regions.
46 Citations
21 Claims
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1. A semiconductor power device disposed in a semiconductor substrate comprises an active cell area and a termination area comprising:
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a semiconductor substrate comprising a bottom substrate layer, and a top substrate layer situated on top of said bottom substrate layer; a planar gate comprising a patterned polysilicon layer disposed on a top surface of said semiconductor substrate; a patterned field oxide layer disposed in said termination area and also in said active cell area at a gap area away from said patterned polysilicon layer on said top surface of said semiconductor substrate; body regions disposed in said semiconductor substrate substantially diffused from a region aligned with said gap area below said top surface and extended to regions below said patterned polysilicon layer and said patterned field oxide layer, said body region having an opposite conductivity type as said top substrate layer; source regions encompassed in and having an opposite conductivity type from said body regions; body contact regions encompassed in and having a higher dopant concentration than said body region surrounding said source regions, the body contact regions being located below said doped source regions, wherein said field oxide layer in the active cell area is removed after forming the body, source and body contact regions; a contact trench formed next to said planar gate, wherein said contact trench is etched into the semiconductor substrate and allows contact to be made laterally to the source and body contact regions, said contact trenches being formed partially in an area previously occupied by said field oxide layer in said active cell area; and a bottom electrode formed at the bottom of the semiconductor substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for manufacturing a semiconductor power device in a semiconductor substrate comprises an active cell area and a termination area comprising:
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growing and patterning a field oxide layer in said termination area and also in said active cell area on a top surface of said semiconductor substrate using a first mask; forming a gate oxide layer on said top surface of said semiconductor substrate; depositing and patterning with a second mask a polysilicon layer on said gate oxide at a gap distance away from said field oxide layer, wherein said polysilicon layer acts as planar gates in the active area; performing a blank body dopant implant to form body dopant regions in said semiconductor substrate substantially aligned with said gap area followed by diffusing said body dopant regions into body regions in said semiconductor substrate; forming body contact regions encompassed in and having a higher dopant concentration than said body regions, wherein said field oxide region reduces the amount of P-body charges found in the semiconductor power device due to forming the body and body contact regions; applying a source mask as the third mask to implant source regions having a conductivity opposite to said body regions with said source regions encompassed in said body regions and located above said high concentration body contact regions; depositing an insulation layer on top of said semiconductor power device and applying a contact mask as the fourth mask to open contact openings and remove said field oxide, and etching into the semiconductor substrate to form contact trenches, wherein said contact trenches further reduce the amount of P-body charges in the device; and depositing a metal layer filling in said contact trenches to contact said body regions and said source regions, and patterning said metal layer with a fifth mask. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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Specification