TRANSPARENT HEAT SHIELDING MATERIAL, FABRICATION METHOD THEREOF AND TRANSPARENT HEAT SHIELDING STRUCTURE

• US 20110143116A1
• Filed: 03/30/2010
• Published: 06/16/2011
• Est. Priority Date: 12/16/2009
• Status: Active Grant

• Current Assignee: Industrial Technology Research Institute
• Original Assignee: Industrial Technology Research Institute
• Inventors: Fu, Huai-Kuang, Chang, Yih-Her, Chung, Pao-Tang, Chern, Jer-Young, Jong, Sung-Jeng
• Granted Patent: US 8,304,099 B2
• Time in Patent Office: Days
• US Class Current: 428/220
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C01G 41/006 Compounds containing, besides tungsten, two or more other elements, with the exception of oxygen or hydrogen
• CPC Class Codes: C01P 2002/52 containing elements as dopants
• CPC Class Codes: C01P 2004/64 Nanometer sized, i.e. from 1-100 nanometer
• CPC Class Codes: C03C 17/25 by deposition from the liquid phase
• CPC Class Codes: C03C 2217/219 CrOx, MoOx, WOx
• CPC Class Codes: C03C 2217/24 Doped oxides
• CPC Class Codes: C03C 2217/241 with halides
• CPC Class Codes: C03C 2218/11 from solutions or suspensions

Abstract

A transparent heat shielding material, a fabrication method thereof and a transparent heat shielding structure are provided. The transparent heat shielding material is represented by M_xWO_3-yA_y, wherein M is at least one element of alkali metal, W is tungsten, O is oxygen, A is halogen, 0<x≦1, and 0<y≦0.5. The transparent heat shielding material M_xWO_3-yA_y is formed from tungsten oxide with at least one alkali metal cation and halogen anion co-doping into. The transparent heat shielding structure includes one or more layers of a transparent heat shielding film, wherein the transparent heat shielding film includes the material M_xWO_3-yA_y.

Claims

1. A transparent heat shielding material, comprising tungsten oxide having at least one alkali metal and halogen co-doping, represented by Formula (I):

M_xWO_3-yA_y 

 

Formula (I),

wherein M is at least one alkali metal element, W is tungsten, O is oxygen, A is halogen element, 0<

x≦

1, and 0<

y≦

0.5.

2. The transparent heat shielding material as claimed in claim 1, wherein M is selected from the group consisting of lithium (Li), sodium (Na), potassium (K), rubidium (Rb) and cesium (Cs).

3. The transparent heat shielding material as claimed in claim 1, wherein A is selected from the group consisting of fluorine (F), chlorine (Cl), bromine (Br) and iodine (I).

4. The transparent heat shielding material as claimed in claim 1, having a plasma wavelength of 800 nm to 1000 nm.

5. The transparent heat shielding material as claimed in claim 1, further comprising one or more than one oxide covering the tungsten oxide M_xWO_3-yA_y, wherein the oxide is selected from the group consisting of silicon oxide, zirconium oxide, titanium oxide and aluminum oxide.

6. The transparent heat shielding material as claimed in claim 1, further comprising silane or an organic-metal functional group covering the tungsten oxide of M_xWO_3-yA_y.

7. A method for forming a transparent heat shielding material, comprising:

providing a precursor for forming tungsten oxide;

providing a halogen salt and an alkali metal salt for mixing with the precursor for forming tungsten oxide to form a mixture, wherein the halogen salt has a halogen anion and the alkali metal salt has at least one alkali metal cation; and

performing a reduction reaction to the mixture in a hydrogen environment to form tungsten oxide having at least one alkali metal cation and the halogen anion co-doping, represented by Formula (I);

M_xWO_3-yA_y 

 

Formula (I),

wherein M is the at least one alkali metal element, W is tungsten, O is oxygen, A is halogen element, 0<

x≦

1, and 0<

y≦

0.5.

8. The method as claimed in claim 7, wherein the precursor for forming tungsten oxide is selected from the group consisting of ammonium metatungstate, ammonium orthotungstate, ammonium paratungstate, alkali metal tungstate, tungstic acid, tungsten silicide, tungsten sulfide, tungsten oxychloride, tungsten alkoxide, tungsten hexachloride, tungsten tetrachloride, tungsten bromide, tungsten fluoride, tungsten carbide and tungsten oxycarbide.

9. The method as claimed in claim 7, wherein the alkali metal salt is represented by a formula of M_pN, and wherein M is an alkali metal element selected from the group consisting of lithium (Li), sodium (Na), potassium (K), rubidium (Rb) and cesium (Cs), N is an anion or an anion group with negative valence, and 1≦

p≦

12.

10. The method as claimed in claim 9, wherein the alkali metal salt is selected from the group consisting of alkali metal carbonate, alkali metal hydrogen carbonate, alkali metal nitrate, alkali metal nitrite, alkali metal hydroxide, alkali metal halide, alkali metal sulfate and alkali metal sulfite.

11. The method as claimed in claim 7, wherein the halogen salt is represented by a formula of PA_q, and wherein A is halogen element selected from the group consisting of fluorine (F), chlorine (Cl), bromine (Br) and iodine (I), P is a cation or a cation group with positive valence, and 1≦

q≦

12.

12. The method as claimed in claim 11, wherein the halogen salt is selected from the group consisting of ammonium halide, alkylammonium salt, halocarbon, hydrogen halide, tungsten halide, benzene halide, halogenated aromatic and alkyl halide.

13. The method as claimed in claim 7, wherein the step of mixing precursor for forming tungsten oxide, the alkali metal salt and the halogen salt is performed in a liquid system or a solid system.

14. The method as claimed in claim 13, wherein in the liquid system, before the step of performing the reduction reaction, further comprises heating the mixture to remove a solvent therein.

15. The method as claimed in claim 7, wherein the reduction reaction is performed at a temperature between 300°

C. and 800°

C.

16. The method as claimed in claim 7, wherein the halogen in the material M_xWO_3-yA_y is further provided from the alkali metal salt, the precursor for forming tungsten oxide or the combination thereof.

17. The method as claimed in claim 7, wherein a doping ratio of the alkali metal cation is different from a doping ratio of the halogen anion.

18. The method as claimed in claim 7, wherein a doping ratio of the alkali metal cation is the same as a doping ratio of the halogen anion.

19. The method as claimed in claim 7, further comprising performing a milling process to the material M_xWO_3-yA_y to form a powder of M_xWO_3-yA_y having a diameter less than 100 nm.

20. A transparent heat shielding structure, comprising:

one or more than one layer of a transparent heat shielding film, wherein the transparent heat shielding film includes a tungsten oxide having at least one alkali metal and halogen co-doping, represented by Formula (I);

M_xWO_3-yA_y 

 

Formula (I),

wherein M is the at least one alkali metal element, W is tungsten, O is oxygen, A is halogen element, 0<

x≦

1, and 0<

y≦

0.5.

21. The transparent heat shielding structure as claimed in claim 20, wherein the layers of the transparent heat shielding films have different compositions of the material M_xWO_3-yA_y.

22. The transparent heat shielding structure as claimed in claim 20, wherein the transparent heat shielding film further comprises a binder and the material M_xWO_3-yA_y is dispersed in the binder.

23. The transparent heat shielding structure as claimed in claim 22, wherein the material M_xWO_3-yA_y is 1 to 99 percent by weight in the transparent heat shielding film.

24. The transparent heat shielding structure as claimed in claim 22, wherein the binder comprises an organic binder, an inorganic binder or a pressure sensitive adhesive.

25. The transparent heat shielding structure as claimed in claim 20, wherein the transparent heat shielding film has a thickness of 1 μ

m to 100 μ

m.