Maskless exposure apparatus and multi-head alignment method thereof

  • US 20110149297A1
  • Filed: 12/15/2010
  • Published: 06/23/2011
  • Est. Priority Date: 12/22/2009
  • Status: Abandoned Application
First Claim
Patent Images

1. A mask-less exposure apparatus, comprising:

  • a stage configured to move a substrate;

    a multi-optical system configured to irradiate beams on the substrate to expose a pattern on the substrate;

    a plurality of lens barrels configured to guide the beams emitted from the multi-optical system to the substrate;

    a lens barrel drive unit configured to drive the plurality of lens barrels;

    a beam measurement device configured to measure positions of the beams; and

    a control unit configured to control the lens barrel drive unit to align positions and angles of the plurality of lens barrels according to errors in position of the beams measured by the beam measurement device, the errors resulting from a deviation of the beam measurement device from a reference position.

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