LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• US 20110285977A1
• Filed: 08/01/2011
• Published: 11/24/2011
• Est. Priority Date: 06/09/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Sengers, Timotheus Franciscus, Donders, Sjoerd Nicolaas Lambertus, Bijlaart, Erik Theodorus Maria, Meijer, Hendricus Johannes Maria, Mulkens, Johannes Catharinus Hubertus, Butler, Hans, Streefkerk, Bob, Den Boef, Arie Jeffrey Maria, Van Schaik, Frank, De Smit, Joannes Theodoor, Kroon, Mark, Loopstra, Erik Roelof, Straaijer, Alexander, Kolesnychenko, Aleksey Yurievich, Ritsema, Roelof Aeilko Siebrand, Van De Kerkhof, Marcus Adrianus, Van Santen, Helmar, Simon, Klaus, Ottens, Joost Jeroen, Hoogendam, Christiaan Alexander, Mertens, Jeroen Johannes Sophia Maria, LOF, Joeri
• Granted Patent: US 9,081,299 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70141 Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70883 of optical system

Abstract

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

Claims

1. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate;

a projection system adapted to project a patterned beam onto a target portion of a substrate;

a liquid supply system configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid; and

a sensor capable of being positioned to be illuminated by a beam of radiation once it has passed through the liquid.

2. An apparatus according to claim 1, wherein the substrate table comprises a support surface configured to support an intermediary plate between the projection system and the sensor and not in contact with the sensor.

3. An apparatus according to claim 2, wherein the sensor comprises a transmission image sensor configured to sense the beam and wherein the intermediary plate is positionable between the sensor and the projection system.

4. An apparatus according to claim 1, wherein the sensor is on the substrate table.

5. An apparatus according to claim 1, wherein the sensor comprises an alignment sensor configured to align the substrate table relative to the projection system.

6. An apparatus according to claim 5, wherein measurement gratings of the alignment sensor have a pitch of less than 500 nm.

7. An apparatus according to claim 5, wherein the alignment sensor is configured to be illuminated obliquely.

8. An apparatus according to claim 1, wherein the sensor comprises a transmission image sensor.

9. An apparatus according to claim 1, wherein the sensor comprises a focus sensor.

10. An apparatus according to claim 1, wherein the sensor comprises a spot or dose sensor, an integrated lens interferometer and scanner, an alignment mark, or any combination of the foregoing.

11. An apparatus according to claim 1, wherein the substrate table comprises an edge seal member configured to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

12. An apparatus according to claim 1, wherein the sensor is configured to be in contact with the liquid and the beam of radiation is configured to come from the projection system or an alignment system.

13. An apparatus according to claim 1, wherein the beam of radiation is the patterned beam.

14. An apparatus according to claim 1, wherein an alignment system comprises the sensor and is configured receive an alignment beam of radiation from the projection system to align the substrate.

15. An apparatus according to claim 4, wherein the substrate table comprises a vacuum port configured to remove liquid from a space between the substrate table and the sensor.

16. An apparatus according to claim 4, further comprising a bead of material in a space between the substrate table and the sensor configured to prevent entry of the liquid.

17. A device manufacturing method comprising:

projecting a patterned beam of radiation through a liquid onto a sensor; and

projecting a beam of radiation using a projection system of a lithographic apparatus through the liquid onto a radiation-sensitive target portion of a substrate.

18. A method according to claim 17, wherein the liquid is supported on an intermediary plate between the projection system and the sensor, the plate not being in contact with the sensor.

19. A method according to claim 18, wherein the sensor comprises a transmission image sensor configured to sense the patterned beam and the intermediary plate is positionable between the sensor and the projection system.

20. A method according to claim 17, comprising projecting the patterned beam of radiation from the projection system or an alignment system through the liquid onto the sensor in contact with the liquid.