GAS BARRIER FILM, ELECTRONIC DEVICE INCLUDING THE SAME, GAS BARRIER BAG, AND METHOD FOR PRODUCING GAS BARRIER FILM

  • US 20120009368A1
  • Filed: 03/23/2010
  • Published: 01/12/2012
  • Est. Priority Date: 03/30/2009
  • Status: Active Grant
First Claim
Patent Images

1. A gas barrier film comprising a gas barrier layer in contact with each of both main surfaces of a plastic film,wherein the gas barrier layer is an SiCNFH layer, an SiOCNH layer or an SiCNH layer deposited by Cat-CVD,the SiCNFH layer satisfying conditions of0.01<

  • I(SiH)/I(SiN)<

    0.05,0.00<

    I(CH)/I(SiN)<

    0.07,0.04<

    I(NH)/I(SiN)<

    0.08, and0.05<

    I(CF)/I(SiN)<

    0.3;

    the SiOCNH layer satisfying conditions of0.1<

    I(SiH)/I(NH)<

    0.9,0.0<

    I(CH)/I(NH)<

    0.3,8<

    I(SiN)/I(NH)<

    20, and2<

    I(SiO2)/I(NH)<

    8; and

    the SiCNH layer satisfying conditions of0.01<

    I(SiH)/I(SiN)<

    0.05,0.00<

    I(CH)/I(SiN)<

    0.07 and0.04<

    I(NH)/I(SiN)<

    0.08;

    where the “

    I”

    represents peak intensity of Fourier transform infrared spectroscopy related to the atomic bond shown in the parentheses after the “

    I”

    .

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