GATE VALVE AND SUBSTRATE PROCESSING APPARATUS EQUIPPED WITH THE SAME

• US 20120055400A1
• Filed: 03/29/2010
• Published: 03/08/2012
• Est. Priority Date: 03/31/2009
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Hiroki, Tsutomu, Nishiba, Takehiro, Nose, Masaaki, Matsushita, Masanao
• Granted Patent: US 8,590,861 B2
• Time in Patent Office: Days
• US Class Current: 118/620
• CPC Class Codes: F16K 1/24 with valve members that, on opening of the valve, are initially lifted from the seat and next are turned around an axis parallel to the seat
• CPC Class Codes: F16K 1/443 the seats being in series
• CPC Class Codes: F16K 51/02 specially adapted for high-vacuum installations

Abstract

Agate valve apparatus is disclosed. The gate valve apparatus is provided with a valve casing that includes a first valve seat and a second valve seat, and in which an opening portion is formed; and a closure element that includes a sealing member that contacts the first valve seat to seal the opening portion. In addition, the gate valve apparatus is provided with a shutoff member that contacts the second valve seat to thereby be deformed, so that a space between the opening portion and a sealing member is shut off by the shutoff member when the closure element closes the opening portion. The shutoff member is deformed and continues to contact the second valve seat under normal and high temperature environments when the closure element closes the opening portion.

Claims

1. A gate valve apparatus comprising:

a valve casing that includes a first valve seat and a second valve seat, and in which an opening portion is formed;

a closure element that is capable of closing the opening portion

a sealing member that is provided in the closure element, and contacts the first valve seat thereby to seal the opening portion when the closure element closes the opening portion; and

a shutoff member that is made of a thin metal plate and attached in the closure element, and contacts the second valve seat thereby to shut off a space between the opening portion and the sealing member when the closure element closes the opening portion.

2. The gate valve apparatus of claim 1, wherein a surface of the shutoff member is coated with fluorine resin.

3. The gate valve apparatus of claim 1, further comprising a closure element driving mechanism that drives the closure element to either one of a first position where the closure element opposes an inner wall of the valve casing and a second position where the closure element opposes the opening portion.

4. The gate valve apparatus of claim 3, wherein the closure element driving mechanism comprises:

a supporting piece that is coupled with a portion opposite to a position where the sealing member is provided in the closure element, and supports the closure element;

a supporting portion that slidably supports the supporting piece and includes a hollow portion; and

a shaft that includes a shaft body portion that rotatably supports the supporting portion by way of the hollow portion of the supporting portion, and an eccentric shaft portion that is eccentric from a rotational shaft of the shaft and is provided in the shaft body portion,

wherein the eccentric shaft portion is eccentrically rotated along with rotation of the shaft in the supporting portion and acts on the supporting piece thereby to press the closure element to the opening portion.

5. The gate valve apparatus of claim 1, wherein the shutoff member is attached on the closure element leaving a clearance that allows the shutoff member to be deformed when the shutoff member contacts the second valve seat.

6. A substrate processing apparatus that utilizes electromagnetic waves thereby to process a substrate, the substrate processing apparatus comprising:

a process chamber that has an opening portion that allows the substrate to pass therethrough; and

the gate valve apparatus of claim 1 that is attached in the process chamber, and opens and closes the opening portion.